We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.
© 2012 Optical Society of Korea
(110.3960) Imaging systems : Microlithography
(220.3740) Optical design and fabrication : Lithography
(220.4000) Optical design and fabrication : Microstructure fabrication
(070.6120) Fourier optics and signal processing : Spatial light modulators
Original Manuscript: August 8, 2012
Revised Manuscript: August 24, 2012
Manuscript Accepted: August 24, 2012
Published: September 25, 2012
Jung-Yu Hur and Man-Seung Seo, "Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography," J. Opt. Soc. Korea 16, 221-227 (2012)
References are not available for this paper.
OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.