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Optica Publishing Group
  • Journal of the Optical Society of Korea
  • Vol. 16,
  • Issue 3,
  • pp. 221-227
  • (2012)

Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography

Open Access Open Access

Abstract

We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.

© 2012 Optical Society of Korea

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