It is very important to analyze effectively the tolerance of an optical system with high resolution as the projection lens of photolithography or as the objective lens of a microscope. We would like to find an effective assembly structure and compensators to correct aberrations through global wavefront sensitivity analysis using Zernike polynomial expansion from the field and pupil coordinates rather than from only pupil coordinates. In this paper, we introduce global wavefront coefficients by small perturbations of the optical system, and analyze the optical performance with these coefficients. From this analysis, it is possible to see how we can enlarge the tolerance through the proper assembly structure and compensators.
© 2012 Optical Society of Korea
(080.1010) Geometric optics : Aberrations (global)
(220.1000) Optical design and fabrication : Aberration compensation
(220.1140) Optical design and fabrication : Alignment
(080.2208) Geometric optics : Fabrication, tolerancing
Original Manuscript: July 23, 2012
Revised Manuscript: July 31, 2012
Manuscript Accepted: August 2, 2012
Published: September 25, 2012
Won-Don Joo, "Wavefront Sensitivity Analysis Using Global Wavefront Aberration in an Unobscured Optical System," J. Opt. Soc. Korea 16, 228-235 (2012)
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