Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • Journal of the Optical Society of Korea
  • Vol. 16,
  • Issue 3,
  • pp. 228-235
  • (2012)

Wavefront Sensitivity Analysis Using Global Wavefront Aberration in an Unobscured Optical System

Open Access Open Access

Abstract

It is very important to analyze effectively the tolerance of an optical system with high resolution as the projection lens of photolithography or as the objective lens of a microscope. We would like to find an effective assembly structure and compensators to correct aberrations through global wavefront sensitivity analysis using Zernike polynomial expansion from the field and pupil coordinates rather than from only pupil coordinates. In this paper, we introduce global wavefront coefficients by small perturbations of the optical system, and analyze the optical performance with these coefficients. From this analysis, it is possible to see how we can enlarge the tolerance through the proper assembly structure and compensators.

© 2012 Optical Society of Korea

PDF Article
More Like This
Orthonormal polynomials in wavefront analysis: error analysis

Guang-ming Dai and Virendra N. Mahajan
Appl. Opt. 47(19) 3433-3445 (2008)

Design of optical systems that maximize as-built performance using tolerance/compensator-informed optimization

Brian J. Bauman and Michael D. Schneider
Opt. Express 26(11) 13819-13840 (2018)

Orthonormal polynomials in wavefront analysis: analytical solution

Virendra N. Mahajan and Guang-ming Dai
J. Opt. Soc. Am. A 24(9) 2994-3016 (2007)

Cited By

Optica participates in Crossref's Cited-By Linking service. Citing articles from Optica Publishing Group journals and other participating publishers are listed here.


Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved