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Journal of the Optical Society of Korea

Journal of the Optical Society of Korea

| PUBLISHED BY THE OPTICAL SOCIETY OF KOREA

  • Vol. 17, Iss. 1 — Feb. 1, 2013
  • pp: 73–80

Detection System for Sub-micrometer Defects of a Photo-mask Using On-axis Interference between Reflected and Scattered Lights

Sangon Lee, Jae Heung Jo, Jong Soo Kim, and Il Kweon Moon  »View Author Affiliations


Journal of the Optical Society of Korea, Vol. 17, Issue 1, pp. 73-80 (2013)


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Abstract

In the process of lithography using ultra violet light sources for semiconductor devices, most of defects are made by sub-micrometer pollutants generated at photochemical reactions. We proposed and developed a novel vibration-insensitive on-axis interferometer with a sub-micrometer lateral resolution by using the interference between two beams: one scattered from defects and the other reflected from a reference area without defects. The proposed system was successfully demonstrated to detect a small Al defect of 0.5 μm diameter within the inspection time of less than 30 minutes over the area of the photo-mask which is 6 inch by 6 inch square.

© 2013 Optical Society of Korea

OCIS Codes
(120.4630) Instrumentation, measurement, and metrology : Optical inspection
(120.4640) Instrumentation, measurement, and metrology : Optical instruments
(120.4820) Instrumentation, measurement, and metrology : Optical systems
(220.4830) Optical design and fabrication : Systems design

History
Original Manuscript: December 5, 2012
Revised Manuscript: January 22, 2013
Manuscript Accepted: January 22, 2013
Published: February 25, 2013

Citation
Sangon Lee, Jae Heung Jo, Jong Soo Kim, and Il Kweon Moon, "Detection System for Sub-micrometer Defects of a Photo-mask Using On-axis Interference between Reflected and Scattered Lights," J. Opt. Soc. Korea 17, 73-80 (2013)
http://www.opticsinfobase.org/josk/abstract.cfm?URI=josk-17-1-73


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