As the essential techniques for the CD (Critical Dimension) measurement of the LCD pattern, there are various modules such as an optics design, auto-focus [1-4], and precise edge detection. Since the operation of image enhancement to improve the CD measurement repeatability, a ring type of the reflected lighting optics is devised. It has a simpler structure than the transmission light optics, but it delivers the same output. The edge detection is the most essential function of the CD measurements. The CD measurement is a vital inspection for LCDs [5-6] and semiconductors [7-8] to improve the production yield rate, there are numbers of techniques to measure the CD. So in this study, a new subpixel algorithm is developed through facet modeling, which complements the previous sub-pixel edge detection algorithm. Currently this CD measurement system is being used in LCD manufacturing systems for repeatability of less than 30 nm.
© 2013 Optical Society of Korea
(100.0100) Image processing : Image processing
(110.2960) Imaging systems : Image analysis
(120.3940) Instrumentation, measurement, and metrology : Metrology
(150.3045) Machine vision : Industrial optical metrology
(140.3538) Lasers and laser optics : Lasers, pulsed
Original Manuscript: June 20, 2013
Revised Manuscript: August 1, 2013
Manuscript Accepted: August 27, 2013
Published: November 25, 2013
Sung-Hoon Park, Jeong-Ho Lee, and Heui-Jae Pahk, "In-line Critical Dimension Measurement System Development of LCD Pattern Proposed by Newly Developed Edge Detection Algorithm," J. Opt. Soc. Korea 17, 392-398 (2013)
References are not available for this paper.