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Journal of the Optical Society of Korea

Journal of the Optical Society of Korea


  • Vol. 6, Iss. 4 — Dec. 30, 2002
  • pp: 180–184

Gate CD Control for memory Chip using Total Process Proximity Based Correction Method

Byung-Ho Nam and Hyung-J. Lee  »View Author Affiliations

Journal of the Optical Society of Korea, Vol. 6, Issue 4, pp. 180-184 (2002)

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In this study, we investigated mask errors, photo errors with attenuated phase shift mask and off-axis illumination, and etch errors in dry etch conditions. We propose that total process proximity correction (TPPC), a concept merging every process step error correction, is essential in a lithography process when minimum critical dimension (CD) is smaller than the wavelength of radiation. A correction rule table was experimentally obtained applying TPPC concept. Process capability of controlling gate CD in DRAM fabrication should be improved by this method.

© 2002 Optical Society of Korea

OCIS Codes
(110.5220) Imaging systems : Photolithography

Original Manuscript: September 10, 2002
Published: December 1, 2002

Byung-Ho Nam and Hyung-J. Lee, "Gate CD Control for memory Chip using Total Process Proximity Based Correction Method," J. Opt. Soc. Korea 6, 180-184 (2002)

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  1. M. D. Levenson, et al., ED-29, 12 1928 (1982).
  2. K. Hashimoto, S. Usui, S. Hasebe, M. Murota, T. Nakayama, F. Matsuoka, S. Inoue, S. Kobayashi, and K. Yamamoto, Proc. of SPIE Optical Microlithography XI 3334, 224 (1998).
  3. W. Maurer, C. Dolainsky, J. Thiele, C. Friedrich, and P. Karakatsanis, Proc. of SPIE Optical Microlithography XI, 3334, 245 (1998).
  4. A. Misaka, A. Goda, S. Odanaka, S. Kobayashi, and H. Watanabe, VLSI Symposium "98, 170 (1998).
  5. E. Kawamura, T. Haruki, Y. Manabe, and I. Hanyu, Jpn. J. Appl. Phys. 34, 6547 (1995). [CrossRef]
  6. B. H. Nam, J. O. Park, D. J. Lee, J. H. Cheong, Y. J. Hwang, and Y. J. Song, Proceedings of SPIE, Photomask and Next-Generation Lithography Mask Technology VII, 4066, 716 (2000).

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