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Construction, fabrication, and investigation of the reflection spectra of one-dimensional photonic crystals obtained by means of vertical anisotropic etching of silicon

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Abstract

This paper discusses the possibility of obtaining one-dimensional photonic crystals based on a system of periodically etched channels in Si <110>. The characteristic matrix method is used to calculate their reflection spectra, which display wide secondary maxima along with the fundamental photon zone. Structures have been fabricated with a period of 4–16 um, and their reflection spectra have been studied. It is shown that the experimental spectra coincide with the calculated values in the measurement region of Lambda= 2–16 um.

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