Abstract

This paper proposes a method of monitoring the optical constants and thickness of a layer while it is being deposited in vacuum, using measurements of the reflectance and transmittance on two substrates with different refractive indices. All four measured signals, as well as the background-illumination signal, are monitored by a monochromatic spatial radiation detector. The system was certified using nickel films up to 80nm thick.

© 2008 Optical Society of America

Improved method for determining the optical constants of thin films and its application to molecular-beam-deposited polycrystalline layers

Paul Meredith, Gerald S. Buller, and Andrew C. Walker
Appl. Opt. 32(28) 5619-5627 (1993)

Determination of optical constants of thin films in the EUV

Richard Ciesielski, Qais Saadeh, Vicky Philipsen, Karl Opsomer, Jean-Philippe Soulié, Meiyi Wu, Philipp Naujok, Robbert W. E. van de Kruijs, Christophe Detavernier, Michael Kolbe, Frank Scholze, and Victor Soltwisch
Appl. Opt. 61(8) 2060-2078 (2022)

On the Variation with Wavelength of the Optical Constants of Thin Metallic Films

G. Rasigni and P. Rouard
J. Opt. Soc. Am. 53(5) 604-612 (1963)

Evanescent wave spectroscopy for the determination of the optical constants of thin silver films deposited on a silver-halide fiber

Yair Dankner and A. Katzir
Appl. Opt. 36(4) 873-876 (1997)

Determining the optical constants of vacuum evaporated ii–vi compound thin films with optical waveguides

K. Sasaki, Y. Kudo, H. Watanabe, and O. Hamano
Appl. Opt. 20(21) 3715-3718 (1981)