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Journal of Optical Technology

Journal of Optical Technology


  • Vol. 76, Iss. 7 — Jul. 1, 2009
  • pp: 392–394

Nonlinear processing of diffraction and interference patterns

N. G. Vlasov and S. M. Kulish  »View Author Affiliations

Journal of Optical Technology, Vol. 76, Issue 7, pp. 392-394 (2009)

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This paper briefly explains the algorithm proposed earlier for the nonlinear processing of interferograms, making it possible to increase their sensitivity all the way to the limiting value. It is shown that this algorithm can be adapted to increase the sensitivity of the phase-contrast method and to process diffraction patterns. Such processing allows the size of a microscopic object the illumination of which produces a diffraction pattern to be determined with increased accuracy.

© 2009 Optical Society of America

N. G. Vlasov and S. M. Kulish, "Nonlinear processing of diffraction and interference patterns," J. Opt. Technol. 76, 392-394 (2009)

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  1. N. G. Vlasov and S. M. Kulish , “Nonlinear processing of interferograms,” Nelin. Mir 5, 620 (2007).
  2. A. G. Sergeev , Metrology (Logos, Moscow, 2005).
  3. N. G. Vlasov , B. S. Kinber , and É. G. Semenov , “Apodization of optical elements,” Komp'yut. Opt. No. 5, 29 (1989).
  4. N. G. Vlasov and Sh. D. Mukhtarov , “Self-apodization in the images of microobjects that coincide in shape with the aperture,” Prikl. Mat. Tekhn. Fiz. No. 3, 29 (1999).
  5. C. R. Ewanov and C. Sorubay , “Measurement of transient spray size distributions,” Opt. Eng. (Bellingham) 23, 620 (1984).

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