OSA's Digital Library

Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 79, Iss. 5 — May. 1, 2012
  • pp: 289–294

The limiting possibilities of interference photolithography implemented in the visible region on thin films of glassy chalcogenide semiconductor

S. N. Koreshev and V. P. Ratushnyĭ  »View Author Affiliations


Journal of Optical Technology, Vol. 79, Issue 5, pp. 289-294 (2012)
http://dx.doi.org/10.1364/JOT.79.000289


View Full Text Article

Acrobat PDF (1092 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

This paper presents the results of investigating the parameters (minimum repetition period of the elements and porosity) of structures obtained under the action of argon laser radiation on thin films of glassy chalcogenide semiconductor deposited on layers of x-ray-amorphous chromium. It is shown that thin films of a three-component glassy semiconductor exposed by radiation with wavelength 0.488 µm can be used in the method of interference photolithography to obtain structures with a minimum period of 260 nm and a minimum size of the structural element of 65 nm. It is established that the minimum size of a structural element can be reduced to 50 nm when the repetition period of the elements is increased to 600 nm by using the “two-mask” technology of interference photolithography.

© 2012 OSA

History
Original Manuscript: October 13, 2011
Published: May 30, 2012

Citation
S. N. Koreshev and V. P. Ratushnyĭ, "The limiting possibilities of interference photolithography implemented in the visible region on thin films of glassy chalcogenide semiconductor," J. Opt. Technol. 79, 289-294 (2012)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-79-5-289

You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Log in to access OSA Member Subscription

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited