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Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 80, Iss. 11 — Nov. 1, 2013
  • pp: 714–716

Forming a silicon nanocomposite by laser annealing in a strong oxidant medium

L. V. Grigor’ev and A. V. Mikhaĭlov  »View Author Affiliations


Journal of Optical Technology, Vol. 80, Issue 11, pp. 714-716 (2013)
http://dx.doi.org/10.1364/JOT.80.000714


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Abstract

This paper discusses the transmission spectra of a nanocomposite created by a new electron–ion technology—low-temperature laser surface modification of a layer of nanoporous silicon in a medium of a strong gaseous oxidant. A selective-absorption effect has been detected in the IR range. It is shown that the transmission spectrum of laser-oxidized nanoporous silicon has the form of a complex curve with four local minima, lying in the wavenumber ranges 4000–2750  cm−1, 2400–2100  cm−1, 1900–1600  cm−1, and 1300–1000  cm−1. A comparison of the transmission spectra of thermally oxidized nanoporous silicon and laser-modified nanoporous silicon in a strong oxidant atmosphere made it possible to explain the selective absorption of optical radiation in the nanocomposite thus created.

© 2014 Optical Society of America

OCIS Codes
(140.3390) Lasers and laser optics : Laser materials processing
(160.3380) Materials : Laser materials
(160.5690) Materials : Rare-earth-doped materials

History
Original Manuscript: May 28, 2013
Published: January 23, 2014

Citation
L. V. Grigor’ev and A. V. Mikhaĭlov, "Forming a silicon nanocomposite by laser annealing in a strong oxidant medium," J. Opt. Technol. 80, 714-716 (2013)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-80-11-714

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