Abstract

An engineering technique is proposed for determining the complex refractive index and thickness of absorbing films on a transparent substrate, based on a measurement of the transmittances of the s and p components at a fixed wavelength for two angles of incidence of the radiation. Two samples with known thickness ratio of the films are used in this case.

Determination of optical parameters and thickness of weakly absorbing thin films from reflectance and transmittance spectra

Vitaly P. Kutavichus, Valery V. Filippov, and Vitali H. Huzouski
Appl. Opt. 45(19) 4547-4553 (2006)

Ellipsometric Method for the Determination of All the Optical Parameters of the System of an Isotropic Nonabsorbing Film on an Isotropic Absorbing Substrate. Optical Constants of Silicon*

K. Vedam, W. Knausenberger, and F. Lukes
J. Opt. Soc. Am. 59(1) 64-71 (1969)

Weakly absorbing layers: interferometric determination of their optical parameters

Y. Demner and J. Shamir
Appl. Opt. 17(23) 3738-3745 (1978)

Method for determination of the parameters of transparent ultrathin films deposited on transparent substrates under conditions of low optical contrast

Andriy Kostruba, Yuriy Stetsyshyn, and Rostyslav Vlokh
Appl. Opt. 54(20) 6208-6216 (2015)

Determination of (n,k) for absorbing thin films using reflectance measurements

J. M. Siqueiros, Luis E. Regalado, and R. Machorro
Appl. Opt. 27(20) 4260-4264 (1988)