OSA's Digital Library

Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 70, Iss. 8 — Aug. 1, 2003
  • pp: 566–569

Spatial dispersion of crystals as a critical problem for deep UV lithography

A. G. Serebryakov and F. Bociort

Journal of Optical Technology, Vol. 70, Issue 8, pp. 566-569 (2003)
http://dx.doi.org/10.1364/JOT.70.000566


View Full Text Article

Acrobat PDF (383 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

The birefringence effect caused by spatial dispersion in crystals has been known for more than a hundred years, but until recently it was studied only from the viewpoint of theoretical physics. This article discusses the mathematical description of the effect as well as problems associated with the presence of the effect in modern lithographic optical systems and methods of solving these problems.

Citation
A. G. Serebryakov and F. Bociort, "Spatial dispersion of crystals as a critical problem for deep UV lithography," J. Opt. Technol. 70, 566-569 (2003)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-70-8-566


Sort:  Journal  |  Reset

References

References are not available for this paper.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited