Abstract
This paper provides a theoretical basis and experimental confirmation of two versions of systems for recording and reconstructing reflective relief-phase holograms that provide aberration-free, speckle-free imaging of two-dimensional objects of microscopic scale. The first version of the system is based on the replacement of the projection lens of a relief-phase hologram-projector, and the second system is based on the near-field correction that is conventional for photolithography. Samples of hologram-projectors are obtained and investigated that form an image of a photolithographic target at a wavelength of 0.488 µm, with a characteristic size of 0.8 µm. It is concluded that it is promising to undertake further work directed toward the introduction of optical-holography methods into short-wavelength photolithography. © 2004 Optical Society of America
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription