This paper provides a theoretical basis and experimental confirmation of two versions of systems for recording and reconstructing reflective relief-phase holograms that provide aberration-free, speckle-free imaging of two-dimensional objects of microscopic scale. The first version of the system is based on the replacement of the projection lens of a relief-phase hologram-projector, and the second system is based on the near-field correction that is conventional for photolithography. Samples of hologram-projectors are obtained and investigated that form an image of a photolithographic target at a wavelength of 0.488 µm, with a characteristic size of 0.8 µm. It is concluded that it is promising to undertake further work directed toward the introduction of optical-holography methods into short-wavelength photolithography. © 2004 Optical Society of America

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