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Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 71, Iss. 6 — Jun. 1, 2004
  • pp: 415–419

Electron-beam-induced absorption in quartz glasses

P. B. Sergeev, V. D. Zvorykin, A. P. Sergeev, T. A. Ermolenko, S. A. Popov, M. S. Pronina, P. K. Turoverov, I. I. Cheremisin, and I. K. Evlampiev  »View Author Affiliations


Journal of Optical Technology, Vol. 71, Issue 6, pp. 415-419 (2004)
http://dx.doi.org/10.1364/JOT.71.000415


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Abstract

Electron-beam-induced absorption in quartz glasses of types KS-4V, KU-1, and Corning 7940 has been experimentally investigated in the 150-1000-nm region. Samples of optical materials were irradiated in regimes similar to the operating conditions of the windows of electron-beam excimer lasers, in particular, powerful KrF lasers for laser thermonuclear synthesis. It is shown that the electron-beam-induced absorption in all the quartz glasses that were tested reaches a steady-state level during irradiation that is determined by the mean specific power density of the electron beam. Under identical irradiation conditions, the steady-state absorption level in KS-4V glass in the UV region is about a factor of 4 less than in KU-1 glass and a factor of 2 less than in Corning 7940. © 2004 Optical Society of America

Citation
P. B. Sergeev, V. D. Zvorykin, A. P. Sergeev, T. A. Ermolenko, S. A. Popov, M. S. Pronina, P. K. Turoverov, I. I. Cheremisin, and I. K. Evlampiev, "Electron-beam-induced absorption in quartz glasses," J. Opt. Technol. 71, 415-419 (2004)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-71-6-415


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