Abstract
This paper discusses a thermochemical method for recording information, based on
local laser oxidation of thin chromium films, followed by etching of the unirradiated
region. This method is an alternative to laser photolithography and direct laser removal
of a chromium film. It is mainly used to fabricate diffraction optical elements. The
thermochemical method of recording information lacks the thermal and hydrodynamic
distortions of the pattern that characterize laser ablation, while the number of process
operations is substantially less than in photolithography. Diffraction optical elements
are currently used in large telescopes, microlens arrays, laser optics, etc. The main
requirement on all types of diffraction optical elements is high spatial resolution. The
search for methods of increasing the resolution of diffraction optical elements is the
main motivation for studying the structure of irradiated chromium films.
© 2011 OSA
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