Abstract
A theoretical analysis of how the permittivity of a broad-band semiconductor
varies while it is being acted on by a femtosecond laser pulse is presented, taking into
account various types of emission phenomena. The spatial permittivity distribution
considered here is modelled experimentally, using surface plasmon resonance on the
corresponding multilayer structures and is compared with the data of femtosecond
microstructuring of silicon at a wavelength of 1.25 µm.
© 2011 OSA
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