Abstract

This paper discusses the implementation of a photolithographic process based on synthesized “focused-image” holograms that operate in combination with a low-quality objective. Recommendations are formulated and substantiated concerning the choice of parameters for the synthesis and display of holograms that determine the quality of the images reproduced using them. It is shown to be promising to use this system to solve problems of ultrashort-wavelength photolithography. It is established that using a hologram and a projection system in combination makes it possible to achieve the optically limited minimum characteristic size of the photomask element, equal to the wavelength of the reconstructing radiation.

© 2011 OSA

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