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Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 79, Iss. 5 — May. 1, 2012
  • pp: 295–298

Study of methods for discretizing a source when modelling a photolithographic image

T. V. Ivanova and L. V. Zueva  »View Author Affiliations


Journal of Optical Technology, Vol. 79, Issue 5, pp. 295-298 (2012)
http://dx.doi.org/10.1364/JOT.79.000295


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Abstract

There are two methods for discretizing the source when the formation of a photolithographic image is modelled in terms of the Abbe model: This can be done using a rectangular grid with various discretization steps, or with radial placement of the points on a rectangular grid with various steps along a radius and along the arc length between the points. It is shown that the use of a radial distribution of the points significantly speeds up the computation process, with the modelling accuracy being mainly determined by the step along the radius.

© 2012 OSA

History
Original Manuscript: November 16, 2011
Published: May 30, 2012

Citation
T. V. Ivanova and L. V. Zueva, "Study of methods for discretizing a source when modelling a photolithographic image," J. Opt. Technol. 79, 295-298 (2012)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-79-5-295

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