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Journal of Optical Technology

Journal of Optical Technology


  • Vol. 79, Iss. 5 — May. 1, 2012
  • pp: 295–298

Study of methods for discretizing a source when modelling a photolithographic image

T. V. Ivanova and L. V. Zueva  »View Author Affiliations

Journal of Optical Technology, Vol. 79, Issue 5, pp. 295-298 (2012)

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There are two methods for discretizing the source when the formation of a photolithographic image is modelled in terms of the Abbe model: This can be done using a rectangular grid with various discretization steps, or with radial placement of the points on a rectangular grid with various steps along a radius and along the arc length between the points. It is shown that the use of a radial distribution of the points significantly speeds up the computation process, with the modelling accuracy being mainly determined by the step along the radius.

© 2012 OSA

Original Manuscript: November 16, 2011
Published: May 30, 2012

T. V. Ivanova and L. V. Zueva, "Study of methods for discretizing a source when modelling a photolithographic image," J. Opt. Technol. 79, 295-298 (2012)

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  1. T. Heil, P. Graupner, R. Garreis, R. Egger, M. Brotsack, J. Finders, and S. Hansen, “Predictive modeling of advanced illumination pupils used as imaging enhancement for low-k1 applications,” Proc. SPIE 5377, 344 (2004). [CrossRef]
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