This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 ?m to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 ?m to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.
© 2013 Optical Society of America
Original Manuscript: November 14, 2012
Published: May 21, 2013
É. S. Gurevich, Ya. I. Tochitskiĭ, and V. I. Tsuran, "Optical instrumentation for microelectronics," J. Opt. Technol. 80, 289-293 (2013)