OSA's Digital Library

Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 80, Iss. 5 — May. 1, 2013
  • pp: 289–293

Optical instrumentation for microelectronics

É. S. Gurevich, Ya. I. Tochitskiĭ, and V. I. Tsuran  »View Author Affiliations


Journal of Optical Technology, Vol. 80, Issue 5, pp. 289-293 (2013)
http://dx.doi.org/10.1364/JOT.80.000289


View Full Text Article

Acrobat PDF (460 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 ?m to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 ?m to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.

© 2013 Optical Society of America

History
Original Manuscript: November 14, 2012
Published: May 21, 2013

Citation
É. S. Gurevich, Ya. I. Tochitskiĭ, and V. I. Tsuran, "Optical instrumentation for microelectronics," J. Opt. Technol. 80, 289-293 (2013)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-80-5-289


Sort:  Author  |  Journal  |  Reset

References

  1. B. J.  Lin, Optical Lithography: Here is Why (SPIE, Bellingham, Washington, 2009).
  2. K. A.  Valiev, Physical Bases of Submicron Lithography in Microelectronics (Radio i Svyaz’, Moscow, 1984).
  3. Ya. I.  Tochitski?, Optical Technologies of Micro- and Nanoelectronics (RIVSh, Minsk, 2010).
  4. I. M.  Glazkov Ya. A.  Ra?khman, Image Generators in the Production of Integrated Microsystems (Nauka i Tekhnika, Minsk, 1981).
  5. É. S.  Gurevich, L. P.  Psikova, G. V.  Fokova, “Projection objective with magnification—0.1,” Inventor’s Certificate No. 1 177 788.
  6. É. S.  Gurevich, V. I.  Tsuran, G. I.  Tikhonchuk, A. L.  Bogush, “Projection objective with magnification—1/5×,” Patent of the Republic of Belarus No. 5713 (2003).
  7. G. V.  Fokova É. S.  Gurevich, “Illuminator for projection optical printing,” Patent of the Republic of Belarus No. 7688 (2006).
  8. É. S.  Gurevich, G. I.  Tikhonchuk, V. E.  Matyushkov, A. L.  Bogush, A. S.  Age?chenko, V. I.  Tsuran, “Exposure projection system with magnification 1×,” Korean Patent No. 0586062 (2006).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited