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Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 80, Iss. 5 — May. 1, 2013
  • pp: 289–293

Optical instrumentation for microelectronics

É. S. Gurevich, Ya. I. Tochitskiĭ, and V. I. Tsuran  »View Author Affiliations


Journal of Optical Technology, Vol. 80, Issue 5, pp. 289-293 (2013)
http://dx.doi.org/10.1364/JOT.80.000289


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Abstract

This article is devoted to the work of the Design Office of Precision Electronic Machine-Construction (KBTÉM OMO), which for more than fifty years has provided microelectronics for optomechanical equipment. The size of the elements of integrated circuits has been reduced by a factor of 30 (from 5 ?m to 180 nm) by using this equipment, and the accuracy with which they are arranged on the entire area of a wafer has been increased by a factor of 200 (from 2 ?m to 10 nm). The first integrated circuits, with tens of transistors, have metamorphosed into complex functional systems, with billions of transistors.

© 2013 Optical Society of America

History
Original Manuscript: November 14, 2012
Published: May 21, 2013

Citation
É. S. Gurevich, Ya. I. Tochitskiĭ, and V. I. Tsuran, "Optical instrumentation for microelectronics," J. Opt. Technol. 80, 289-293 (2013)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-80-5-289

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