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Journal of Optical Technology

Journal of Optical Technology

| SIMULTANEOUS RUSSIAN-ENGLISH PUBLICATION

  • Vol. 80, Iss. 5 — May. 1, 2013
  • pp: 329–331

Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, and Qianliang Liang  »View Author Affiliations


Journal of Optical Technology, Vol. 80, Issue 5, pp. 329-331 (2013)
http://dx.doi.org/10.1364/JOT.80.000329


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Abstract

In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h?[0,3???m] and a, b?[0,2???m], light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.

© 2013 Optical Society of America

OCIS Codes
(250.3680) Optoelectronics : Light-emitting polymers
(250.5460) Optoelectronics : Polymer waveguides

History
Original Manuscript: November 1, 2012
Published: May 21, 2013

Citation
Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, and Qianliang Liang, "Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist," J. Opt. Technol. 80, 329-331 (2013)
http://www.opticsinfobase.org/jot/abstract.cfm?URI=jot-80-5-329

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