In this paper, we have analyzed the relationship between light propagation performance and uneven thickness of Su8-photo-resist based on EOPCB. Although spinning process is used to even the Su8-photo-resist, the obtained Su8-photo-resist is uneven, which directly affect cross-section shape of core layer. As long as we control h?[0,3???m] and a, b?[0,2???m], light propagation performance does not affected. But, it is easy to actually fabricate EOPCB.
© 2013 Optical Society of America
Original Manuscript: November 1, 2012
Published: May 21, 2013
Qing Tao, Fengguang Luo, Jinxing Zhang, Bingcheng Mo, Rui Zhong, Dandan Miao, Xiaoxing Pan, and Qianliang Liang, "Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist," J. Opt. Technol. 80, 329-331 (2013)