Improved sinusoidal phase plate to extend depth of field in incoherent hybrid imaging systems

• Abstract

• Optics Letters, Vol. 37, Issue 21, pp. 4534-4536 (November 2012)
• Jingang Wang, Jing Bu, Mingwei Wang, Yong Yang, X.-C. Yuan

Single-layer resonant-waveguide grating for polarization and wavelength selection in Yb:YAG thin-disk lasers

• Abstract
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• Optics Express, Vol. 20, Issue 4, pp. 4024-4031 (February 2012)
• Moritz M. Vogel, Martin Rumpel, Birgit Weichelt, Andreas Voss, Matthias Haefner, Christof Pruss, Wolfgang Osten, Marwan Abdou Ahmed, Thomas Graf

Laser lithographic approach to micro-optical freeform elements with extremely large sag heights

• Abstract
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• Optics Express, Vol. 20, Issue 4, pp. 4763-4775 (February 2012)
• Jens Dunkel, Frank Wippermann, Andreas Brückner, Andreas Bräuer, Andreas Tünnermann

Complementary computer generated holography for aesthetic watermarking

• Abstract
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• Optics Express, Vol. 20, Issue 5, pp. 5547-5556 (February 2012)
• Christophe Martinez, Olivier Lemonnier, Fabien Laulagnet, Alain Fargeix, Florent Tissot, Marie Françoise Armand

Subwavelength cylindrical grating by holistic phase-mask coordinate transform

• Abstract
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• Optics Express, Vol. 20, Issue 7, pp. 7946-7953 (March 2012)
• S. Tonchev, Y. Jourlin, C. Veillas, S. Reynaud, N. Lyndin, O. Parriaux, J. Laukkanen, M. Kuittinen

Bright and dark helices of light

• Abstract
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• Optics Express, Vol. 20, Issue 13, pp. 14371-14379 (June 2012)
• Ole Steuernagel

Resonant metamaterials for contrast enhancement in optical lithography

• Abstract
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• Optics Express, Vol. 20, Issue 18, pp. 19928-19935 (August 2012)
• Sabine Dobmann, Dzmitry Shyroki, Peter Banzer, Andreas Erdmann, Ulf Peschel

A new method for obtaining transparent electrodes

• Abstract
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• Optics Express, Vol. 20, Issue 20, pp. 22770-22782 (September 2012)
• Radu Malureanu, Maksim Zalkovskij, Zhengyong Song, Claudia Gritti, Andrei Andryieuski, Qiong He, Lei Zhou, Peter Uhd Jepsen, Andrei V. Lavrinenko

Propagation of plasmons in designed single crystalline silver nanostructures

• Abstract
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• Optics Express, Vol. 20, Issue 22, pp. 24614-24622 (October 2012)
• Shailesh Kumar, Ying-Wei Lu, Alexander Huck, Ulrik L. Andersen

A novel 3D stacking method for Opto-electronic dies on CMOS ICs

• Abstract
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• Optics Express, Vol. 20, Issue 26, pp. B386-B392 (December 2012)
• Pinxiang Duan, Oded. Raz, Barry. E. Smalbrugge, Jeroen Duis, Harm. J. S Dorren

Plasmonic analog of microstrip transmission line and effect of thermal annealing on its propagation loss

• Abstract
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• Optics Express, Vol. 21, Issue 2, pp. 1639-1644 (January 2013)
• Yiting Chen, Jing Wang, Xi Chen, Min Yan, Min Qiu

Three dimensional live cell lithography

• Abstract
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• Optics Express, Vol. 21, Issue 8, pp. 10269-10277 (April 2013)
• Anna Linnenberger, Martha I. Bodine, Callie Fiedler, Justine J. Roberts, Stacey C. Skaalure, Joseph P. Quinn, Stephanie J. Bryant, Michael Cole, Robert R. McLeod

Embedded corrugated long-period fiber gratings for sensing applications

• Abstract

• Applied Optics, Vol. 51, Issue 10, pp. 1453-1458 (April 2012)
• Hsiao-Yuh Wang, Shih-Min Chuo, Chih-Yu Huang, Lon A. Wang

Gradual tilting exposure photo and nano lithography technique

• Abstract

• Applied Optics, Vol. 51, Issue 16, pp. 3329-3337 (June 2012)
• Z. Kolahdouz, J. Koohsorkhi, M. A. Cheraghi, M. Saviz, S. Mohajerzadeh

Pattern-integrated interference lithography: single-exposure fabrication of photonic-crystal structures

• Abstract

• Applied Optics, Vol. 51, Issue 18, pp. 4028-4041 (June 2012)
• Guy M. Burrow, Matthieu C. R. Leibovici, Thomas K. Gaylord

Optical Proximity Corrections for Digital Micromirror Device-based Maskless Lithography

• Abstract
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• Journal of the Optical Society of Korea, Vol. 16, Issue 3, pp. 221-227 (September 2012)
• Jung-Yu Hur, Man-Seung Seo

Determination of Optical Constants of Thin Films in Extreme Ultraviolet Wavelength Region by an Indirect Optical Method

• Abstract
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• Journal of the Optical Society of Korea, Vol. 17, Issue 1, pp. 38-43 (February 2013)
• Hee Young Kang, Jai Dong Lim, Pazhanisami Peranantham, Chang Kwon HwangBo

Ge₂Sb_1.5Bi_0.5Te₅ thin film as inorganic photoresist

• Abstract
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• Optical Materials Express, Vol. 2, Issue 4, pp. 461-468 (April 2012)
• Hongzhu Xi, Qian Liu, Ye Tian, Yongsheng Wang, Shengming Guo, Maoyou Chu

Holographic fabrication of 3D photonic crystals using silicon based reflective optics element

• Abstract
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• Optical Materials Express, Vol. 2, Issue 9, pp. 1236-1241 (September 2012)
• Jeff Lutkenhaus, Franz Aguirre Farro, David George, Kris Ohlinger, Hualiang Zhang, Zsolt Poole, Kevin P. Chen, Yuankun Lin

Monolithic integration of optical waveguide and fluidic channel structures in a thiol-ene/methacrylate photopolymer

• Abstract
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• Optical Materials Express, Vol. 2, Issue 11, pp. 1548-1555 (November 2012)
• Martha-Elizabeth Baylor, Benjamin W. Cerjan, Charlotte R. Pfiefer, Robert W. Boyne, Charles L. Couch, Neil B. Cramer, Christopher N. Bowman, Robert R. McLeod