Contrast in four-beam-interference lithography

• Abstract

• Optics Letters, Vol. 33, Issue 13, pp. 1434-1436 (July 2008)
• Justin L. Stay, Thomas K. Gaylord

Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging

• Abstract

• Optics Letters, Vol. 35, Issue 9, pp. 1404-1406 (May 2010)
• Bo Peng, Xiangzhao Wang, Zicheng Qiu, Qiongyan Yuan, Yuting Cao

Three-dimensional holographic lithography by an iterative algorithm

• Abstract

• Optics Letters, Vol. 36, Issue 13, pp. 2495-2497 (July 2011)
• Joshua J. Cowling, Gavin L. Williams, Alan Purvis, Richard McWilliam, Jose J. Toriz-Garcia, Nicholas L. Seed, Florian B. Soulard, Peter A. Ivey

Computation lithography: virtual reality and virtual virtuality

• Abstract
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• Optics Express, Vol. 17, Issue 15, pp. 12259-12268 (July 2009)
• Edmund Y. Lam, Alfred K. Wong

Mask-less ultraviolet photolithography based on CMOS-driven micro-pixel light emitting diodes

• Abstract
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• Optics Express, Vol. 17, Issue 26, pp. 23522-23529 (December 2009)
• D. Elfström, B. Guilhabert, J. McKendry, S. Poland, Z. Gong, D. Massoubre, E. Richardson, B. R. Rae, G. Valentine, G. Blanco-Gomez, E. Gu, J. M. Cooper, R. K. Henderson, M. D. Dawson

Level-set-based inverse lithography for photomask synthesis

• Abstract
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• Optics Express, Vol. 17, Issue 26, pp. 23690-23701 (December 2009)
• Yijiang Shen, Ngai Wong, Edmund Y. Lam

Advanced mask aligner lithography: new illumination system

• Abstract
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• Optics Express, Vol. 18, Issue 20, pp. 20968-20978 (September 2010)
• Reinhard Voelkel, Uwe Vogler, Andreas Bich, Pascal Pernet, Kenneth J. Weible, Michael Hornung, Ralph Zoberbier, Elmar Cullmann, Lorenz Stuerzebecher, Torsten Harzendorf, Uwe D. Zeitner

Impacts of cost functions on inverse lithography patterning

• Abstract
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• Optics Express, Vol. 18, Issue 22, pp. 23331-23342 (October 2010)
• Jue-Chin Yu, Peichen Yu

Photonic crystal enhanced fluorescence using a quartz substrate to reduce limits of detection

• Abstract
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• Optics Express, Vol. 18, Issue 24, pp. 24793-24808 (November 2010)
• Anusha Pokhriyal, Meng Lu, Vikram Chaudhery, Cheng-Sheng Huang, Stephen Schulz, Brian T. Cunningham

Robust level-set-based inverse lithography

• Abstract
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• Optics Express, Vol. 19, Issue 6, pp. 5511-5521 (March 2011)
• Yijiang Shen, Ningning Jia, Ngai Wong, Edmund Y. Lam

In situ aberration measurement technique based on principal component analysis of aerial image

• Abstract
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• Optics Express, Vol. 19, Issue 19, pp. 18080-18090 (September 2011)
• Lifeng Duan, Xiangzhao Wang, Anatoly Y. Bourov, Bo Peng, Peng Bu

Pixelated source mask optimization for process robustness in optical lithography

• Abstract
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• Optics Express, Vol. 19, Issue 20, pp. 19384-19398 (September 2011)
• Ningning Jia, Edmund Y. Lam

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

• Abstract

• Applied Optics, Vol. 48, Issue 2, pp. 261-269 (January 2009)
• Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, Fan Wang

Fabrication of microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique

• Abstract

• Applied Optics, Vol. 48, Issue 13, pp. 2473-2479 (May 2009)
• Cheng Yi Wu, Ting Hsuan Chiang, Ngoc Diep Lai, Danh Bich Do, Chia Chen Hsu

Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography

• Abstract

• Applied Optics, Vol. 48, Issue 18, pp. 3302-3307 (June 2009)
• Patrick P. Naulleau

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

• Abstract

• Applied Optics, Vol. 48, Issue 19, pp. 3654-3663 (July 2009)
• Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan

Conditions for primitive-lattice-vector-direction equal contrasts in four-beam-interference lithography

• Abstract

• Applied Optics, Vol. 48, Issue 24, pp. 4801-4813 (August 2009)
• Justin L. Stay, Thomas K. Gaylord

Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image

• Abstract

• Applied Optics, Vol. 49, Issue 15, pp. 2753-2760 (May 2010)
• Bo Peng, Xiangzhao Wang, Zicheng Qiu, Yuting Cao, Lifeng Duan

Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography

• Abstract

• Applied Optics, Vol. 50, Issue 3, pp. 271-281 (January 2011)
• Yasuyuki Unno

Optical System with 4 ㎛ Resolution for Maskless Lithography Using Digital Micromirror Device

• Abstract
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• Journal of the Optical Society of Korea, Vol. 14, Issue 3, pp. 266-276 (September 2010)
• Dong-Hee Lee