Computation theory of partially coherent imaging by stacked pupil shift matrix

• Abstract

• JOSA A, Vol. 25, Issue 12, pp. 3111-3119 (December 2008)
• Kenji Yamazoe

Analysis of Ag-superlens performances using spatial convolution formulation

• Abstract

• JOSA A, Vol. 27, Issue 2, pp. 268-275 (February 2010)
• Indra Karnadi, Alexander A. Iskandar, May-On Tjia

Reduction of focal-spot size using dichromats in absorbance modulation

• Abstract

• Optics Letters, Vol. 33, Issue 24, pp. 2916-2918 (December 2008)
• Hsin-Yu Tsai, Henry I. Smith, Rajesh Menon

Diamond waveguides fabricated by reactive ion etching

• Abstract
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• Optics Express, Vol. 16, Issue 24, pp. 19512-19519 (November 2008)
• Mark P. Hiscocks, Kumaravelu Ganesan, Brant C. Gibson, Shane T. Huntington, François Ladouceur, Steven Prawer

PSM design for inverse lithography with partially coherent illumination

• Abstract
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• Optics Express, Vol. 16, Issue 24, pp. 20126-20141 (November 2008)
• Xu Ma, Gonzalo R. Arce

Fabrication of periodic nanovein structures by holography lithography technique

• Abstract
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• Optics Express, Vol. 17, Issue 5, pp. 3362-3369 (March 2009)
• Ngoc Diep Lai, Yu Di Huang, Jian Hung Lin, Danh Bich Do, Chia Chen Hsu

Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography

• Abstract
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• Optics Express, Vol. 17, Issue 7, pp. 5783-5793 (March 2009)
• Xu Ma, Gonzalo R. Arce

Computation lithography: virtual reality and virtual virtuality

• Abstract
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• Optics Express, Vol. 17, Issue 15, pp. 12259-12268 (July 2009)
• Edmund Y. Lam, Alfred K. Wong

Micro/nano scale amorphization of silicon by femtosecond laser irradiation

• Abstract
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• Optics Express, Vol. 17, Issue 19, pp. 16518-16526 (September 2009)
• Amirkianoosh Kiani, Krishnan Venkatakrishnan, Bo Tan

Light Emitting Diodes as an alternative ambient illumination source in photolithography environment

• Abstract
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• Optics Express, Vol. 17, Issue 20, pp. 17293-17302 (September 2009)
• Dennis Corell, Haiyan Ou, Carsten Dam-Hansen, Paul-Michael Petersen, Dan Friis

Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination

• Abstract
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• Optics Express, Vol. 17, Issue 21, pp. 19278-19291 (October 2009)
• Wei Liu, Shiyuan Liu, Tingting Zhou, Lijuan Wang

Level-set-based inverse lithography for photomask synthesis

• Abstract
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• Optics Express, Vol. 17, Issue 26, pp. 23690-23701 (December 2009)
• Yijiang Shen, Ngai Wong, Edmund Y. Lam

Silver superlens using antisymmetric surface plasmon modes

• Abstract
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• Optics Express, Vol. 18, Issue 6, pp. 5459-5465 (March 2010)
• Wook-Jae Lee, Jae-Eun Kim, Hae Yong Park, Myung-Hyun Lee

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

• Abstract

• Applied Optics, Vol. 48, Issue 2, pp. 261-269 (January 2009)
• Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, Fan Wang

Fast computation of constructive and destructive interference areas in partially coherent imaging for resolution enhancement in optical microlithography

• Abstract

• Applied Optics, Vol. 48, Issue 8, pp. 1419-1424 (March 2009)
• Kenji Yamazoe, Yoshiyuki Sekine, Tokuyuki Honda

Fabrication of microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique

• Abstract

• Applied Optics, Vol. 48, Issue 13, pp. 2473-2479 (May 2009)
• Cheng Yi Wu, Ting Hsuan Chiang, Ngoc Diep Lai, Danh Bich Do, Chia Chen Hsu

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

• Abstract

• Applied Optics, Vol. 48, Issue 19, pp. 3654-3663 (July 2009)
• Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan

Incoherently combining logarithmic aspheric lenses for extended depth of field

• Abstract

• Applied Optics, Vol. 48, Issue 28, pp. 5371-5379 (October 2009)
• Kaiqin Chu, Nicholas George, Wanli Chi

Imaging capability of patterned liquid crystals

• Abstract

• Applied Optics, Vol. 48, Issue 32, pp. 6152-6158 (November 2009)
• Graham Myhre, Stanley Pau

Extended dual-grating alignment method for optical projection lithography

• Abstract

• Applied Optics, Vol. 49, Issue 4, pp. 708-713 (February 2010)
• Wangfu Chen, Wei Yan, Song Hu, Yong Yang, Shaolin Zhou