Computation theory of partially coherent imaging by stacked pupil shift matrix

• Abstract

• JOSA A, Vol. 25, Issue 12, pp. 3111-3119 (December 2008)
• Kenji Yamazoe

Application of Huygens-Fresnel diffraction principle for high aspect ratio SU-8 micro-/nanotip array

• Abstract

• Optics Letters, Vol. 33, Issue 1, pp. 40-42 (January 2008)
• Seok Woo Lee, Seung S. Lee

Quasi-Dammann grating with proportional intensity array spots

• Abstract

• Optics Letters, Vol. 33, Issue 18, pp. 2023-2025 (September 2008)
• Shaoxia Li, Gang Yu, Caiyun Zheng, Qiaofeng Tan

Reduction of focal-spot size using dichromats in absorbance modulation

• Abstract

• Optics Letters, Vol. 33, Issue 24, pp. 2916-2918 (December 2008)
• Hsin-Yu Tsai, Henry I. Smith, Rajesh Menon

Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs

• Abstract
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• Optics Express, Vol. 15, Issue 18, pp. 11542-11552 (September 2007)
• Matthew D. Arnold, Richard J. Blaikie

Coma measurement of projection optics in lithographic tools based on relative image displacements at multiple illumination settings

• Abstract
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• Optics Express, Vol. 15, Issue 24, pp. 15878-15885 (November 2007)
• Qiongyan Yuan, Xiangzhao Wang, Zicheng Qiu, Fan Wang, Mingying Ma, Le He

Fabrication of two-layer integrated phase mask for single-beam and single-exposure fabrication of three-dimensional photonic crystal

• Abstract
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• Optics Express, Vol. 16, Issue 12, pp. 9165-9172 (June 2008)
• Yuankun Lin, Ahmad Harb, Daniel Rodriguez, Karen Lozano, Di Xu, K. P. Chen

Absolute sensitivity calibration of extreme ultraviolet photoresists

• Abstract
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• Optics Express, Vol. 16, Issue 15, pp. 11519-11524 (July 2008)
• Patrick P. Naulleau, Eric M. Gullikson, Andrew Aquila, Simi George, Dimitra Niakoula

Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography

• Abstract
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• Optics Express, Vol. 16, Issue 19, pp. 14746-14760 (September 2008)
• Stanley H. Chan, Alfred K. Wong, Edmund Y. Lam

Fast approximation of transfer cross coefficient for optical proximity correction

• Abstract
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• Optics Express, Vol. 16, Issue 19, pp. 15249-15253 (September 2008)
• Romuald Sabatier, Caroline Fossati, Salah Bourennane, Antonio Di Giacomo

Three-dimensional characterization of extreme ultraviolet mask blank defects by interference contrast photoemission electron microscopy

• Abstract
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• Optics Express, Vol. 16, Issue 20, pp. 15343-15352 (September 2008)
• Jingquan Lin, Nils Weber, Matthias Escher, Jochen Maul, Hak-Seung Han, Michael Merkel, Stefan Wurm, Gerd Schönhense, Ulf Kleineberg

Diamond waveguides fabricated by reactive ion etching

• Abstract
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• Optics Express, Vol. 16, Issue 24, pp. 19512-19519 (November 2008)
• Mark P. Hiscocks, Kumaravelu Ganesan, Brant C. Gibson, Shane T. Huntington, François Ladouceur, Steven Prawer

PSM design for inverse lithography with partially coherent illumination

• Abstract
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• Optics Express, Vol. 16, Issue 24, pp. 20126-20141 (November 2008)
• Xu Ma, Gonzalo R. Arce

Fabrication of periodic nanovein structures by holography lithography technique

• Abstract
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• Optics Express, Vol. 17, Issue 5, pp. 3362-3369 (March 2009)
• Ngoc Diep Lai, Yu Di Huang, Jian Hung Lin, Danh Bich Do, Chia Chen Hsu

Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography

• Abstract
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• Optics Express, Vol. 17, Issue 7, pp. 5783-5793 (March 2009)
• Xu Ma, Gonzalo R. Arce

Optical constants of silica glass from extreme ultraviolet to far infrared at near room temperature

• Abstract

• Applied Optics, Vol. 46, Issue 33, pp. 8118-8133 (November 2007)
• Rei Kitamura, Laurent Pilon, Miroslaw Jonasz

Coma measurement by use of an alternating phase-shifting mask mark with a specific phase width

• Abstract

• Applied Optics, Vol. 48, Issue 2, pp. 261-269 (January 2009)
• Zicheng Qiu, Xiangzhao Wang, Qiongyan Yuan, Fan Wang

Fast computation of constructive and destructive interference areas in partially coherent imaging for resolution enhancement in optical microlithography

• Abstract

• Applied Optics, Vol. 48, Issue 8, pp. 1419-1424 (March 2009)
• Kenji Yamazoe, Yoshiyuki Sekine, Tokuyuki Honda

Fabrication of microlens arrays based on the mass transport effect of SU-8 photoresist using a multiexposure two-beam interference technique

• Abstract

• Applied Optics, Vol. 48, Issue 13, pp. 2473-2479 (May 2009)
• Cheng Yi Wu, Ting Hsuan Chiang, Ngoc Diep Lai, Danh Bich Do, Chia Chen Hsu

Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations

• Abstract

• Applied Optics, Vol. 48, Issue 19, pp. 3654-3663 (July 2009)
• Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Qiongyan Yuan, Bo Peng, Lifeng Duan