Emitting far-field multicolor patterns and characters through plastic diffractive micro-optics elements illuminated by common Gaussian lasers in the visible range

• Abstract

• JOSA A, Vol. 28, Issue 4, pp. 724-733 (April 2011)
• Xinyu Zhang, Hui Li, Kan Liu, Jun Luo, Changsheng Xie, An Ji, Tianxu Zhang

Performance enhancements to absorbance-modulation optical lithography. I. Plasmonic reflector layers

• Abstract

• JOSA A, Vol. 28, Issue 11, pp. 2209-2217 (November 2011)
• John E. Foulkes, Richard J. Blaikie

Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses

• Abstract

• JOSA A, Vol. 28, Issue 11, pp. 2218-2225 (November 2011)
• John E. Foulkes, Richard J. Blaikie

Image enhancement for flat and rough film plasmon superlenses by adding loss

• Abstract

• JOSA B, Vol. 28, Issue 10, pp. 2499-2509 (October 2011)
• Haogang Wang, J. Quinn Bagley, Leung Tsang, Shaowu Huang, Kung-Hau Ding, Akira Ishimaru

Advanced mask aligner lithography: new illumination system

• Abstract
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• Optics Express, Vol. 18, Issue 20, pp. 20968-20978 (September 2010)
• Reinhard Voelkel, Uwe Vogler, Andreas Bich, Pascal Pernet, Kenneth J. Weible, Michael Hornung, Ralph Zoberbier, Elmar Cullmann, Lorenz Stuerzebecher, Torsten Harzendorf, Uwe D. Zeitner

Patterned color liquid crystal polymer polarizers

• Abstract
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• Optics Express, Vol. 18, Issue 26, pp. 27777-27786 (December 2010)
• Graham Myhre, Arshad Sayyad, Stanley Pau

Pixel-based OPC optimization based on conjugate gradients

• Abstract
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• Optics Express, Vol. 19, Issue 3, pp. 2165-2180 (January 2011)
• Xu Ma, Gonzalo R. Arce

Robust level-set-based inverse lithography

• Abstract
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• Optics Express, Vol. 19, Issue 6, pp. 5511-5521 (March 2011)
• Yijiang Shen, Ningning Jia, Ngai Wong, Edmund Y. Lam

Displacement Talbot lithography: a new method for high-resolution patterning of large areas

• Abstract
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• Optics Express, Vol. 19, Issue 11, pp. 10686-10691 (May 2011)
• Harun H. Solak, Christian Dais, Francis Clube

Increased process latitude in absorbance-modulated lithography via a plasmonic reflector

• Abstract
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• Optics Express, Vol. 19, Issue 18, pp. 17790-17798 (August 2011)
• Charles W. Holzwarth, John E. Foulkes, Richard J. Blaikie

Pixelated source mask optimization for process robustness in optical lithography

• Abstract
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• Optics Express, Vol. 19, Issue 20, pp. 19384-19398 (September 2011)
• Ningning Jia, Edmund Y. Lam

Structured three-dimensional optical phantom for optical coherence tomography

• Abstract
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• Optics Express, Vol. 19, Issue 20, pp. 19480-19485 (September 2011)
• Andrea Curatolo, Brendan F. Kennedy, David D. Sampson

Modeling of a slit-scan-type aerial image measurement sensor used for optical lithography

• Abstract

• Applied Optics, Vol. 50, Issue 3, pp. 271-281 (January 2011)
• Yasuyuki Unno

Fabrication of ellipticity-controlled microlens arrays by controlling the parameters of the multiple-exposure two-beam interference technique

• Abstract

• Applied Optics, Vol. 50, Issue 4, pp. 579-585 (February 2011)
• Danh Bich Do, Ngoc Diep Lai, Cheng Yi Wu, Jian Hung Lin, Chia Chen Hsu

Freeform lens arrays for off-axis illumination in an optical lithography system

• Abstract

• Applied Optics, Vol. 50, Issue 5, pp. 725-732 (February 2011)
• Rengmao Wu, Haifeng Li, Zhenrong Zheng, Xu Liu

Polarization-dependent circular Dammann grating made of azo-dye-doped liquid crystals

• Abstract

• Applied Optics, Vol. 50, Issue 15, pp. 2316-2321 (May 2011)
• Dan Luo, Xiao Wei Sun, Hai Tao Dai, Hilmi Volkan Demir

Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

• Abstract

• Applied Optics, Vol. 50, Issue 19, pp. 3346-3350 (July 2011)
• Patrick P. Naulleau, Simi A. George

Modeling of through-focus aerial image with aberration and imaginary mask edge effects in optical lithography simulation

• Abstract

• Applied Optics, Vol. 50, Issue 20, pp. 3570-3578 (July 2011)
• Kenji Yamazoe, Andrew R. Neureuther

Optimal 3D phase-shifting masks in partially coherent illumination

• Abstract

• Applied Optics, Vol. 50, Issue 28, pp. 5567-5576 (October 2011)
• Xu Ma, Gonzalo R. Arce, Yanqiu Li

Circular Fibonacci gratings

• Abstract

• Applied Optics, Vol. 50, Issue 31, pp. G142-G148 (November 2011)
• Nan Gao, Yuchao Zhang, Changqing Xie