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Deposition and characterization of germanium sulphide glass planar waveguides

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Abstract

Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 µm/hr at 500°C. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5µm to 7µm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.

©2004 Optical Society of America

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Figures (7)

Fig. 1.
Fig. 1. Chemical vapour deposition (CVD) system for the germanium sulphide glass waveguide fabrication.
Fig. 2.
Fig. 2. SEM picture from side view of the cleaved germanium sulphide glass films on CaF2 (left) and Schott N-PSK58 glass (right) substrates.
Fig. 3.
Fig. 3. Raman spectrum of germanium sulphide glass film by CVD.
Fig. 4.
Fig. 4. Optical transmission range of germanium sulphide glass by CVD.
Fig. 5.
Fig. 5. XRD pattern of germanium sulphide glass film by CVD.
Fig. 6.
Fig. 6. Prism coupling technique for refractive index measurement where np is the refractive index of the Rutile prism, n1 is the refractive index of germanium sulphide glass film, n2 is the refractive index of the substrate, φ is the incidence angle of He-Ne laser on the first surface, ε is the refracting angle of the Rutile prism, θp is the incidence angle of He-Ne laser on the second surface, θ1 is the refractive angle in the germanium sulphide glass film.
Fig. 7.
Fig. 7. SEM picture of germanium sulphide glass channel waveguide by CVD and dry etching process.

Tables (2)

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Table 1. Feasibility of the reaction of H2S and GeCl4 to form GeS2

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Table 2. Effective Index of germanium sulphide glass film by prism coupling technique

Equations (3)

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GeCl 4 + 2 H 2 S GeS 2 + 4 HCl
Δ G r = Δ G f,products Δ G f,reactants
Effective index ( N ) = β k 0 = n 1 sin θ 1 = sin φ cos ε + ( n p 2 sin 2 φ ) 1 2 sin ε
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