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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 26 — Dec. 27, 2004
  • pp: 6600–6605

Quantum lithography by coherent control of classical light pulses

Avi Pe’er, Barak Dayan, Marija Vucelja, Yaron Silberberg, and Asher A. Friesem  »View Author Affiliations

Optics Express, Vol. 12, Issue 26, pp. 6600-6605 (2004)

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The smallest spot in optical lithography and microscopy is generally limited by diffraction. Quantum lithography, which utilizes interference between groups of N entangled photons, was recently proposed to beat the diffraction limit by a factor N. Here we propose a simple method to obtain N photons interference with classical pulses that excite a narrow multiphoton transition, thus shifting the “quantum weight” from the electromagnetic field to the lithographic material. We show how a practical complete lithographic scheme can be developed and demonstrate the underlying principles experimentally by two-photon interference in atomic Rubidium, to obtain focal spots that beat the diffraction limit by a factor of 2.

© 2004 Optical Society of America

OCIS Codes
(020.4180) Atomic and molecular physics : Multiphoton processes
(110.5220) Imaging systems : Photolithography
(180.0180) Microscopy : Microscopy
(320.7110) Ultrafast optics : Ultrafast nonlinear optics

ToC Category:
Research Papers

Original Manuscript: November 19, 2004
Revised Manuscript: December 14, 2004
Published: December 27, 2004

Avi Pe'er, Barak Dayan, Marija Vucelja, Yaron Silberberg, and Asher Friesem, "Quantum lithography by coherent control of classical light pulses," Opt. Express 12, 6600-6605 (2004)

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