Quasi-direct writing of diffractive structures with a focused ion beam

doi:10.1364/OPEX.12.001803

Optics Express

Editor: Michael Duncan
Vol. 12, Iss. 9 — May. 3, 2004
pp: 1803–1809

Quasi-direct writing of diffractive structures with a focused ion beam

Yongqi Fu, Ngoi Bryan, and Wei Zhou »View Author Affiliations

Optics Express, Vol. 12, Issue 9, pp. 1803-1809 (2004)
http://dx.doi.org/10.1364/OPEX.12.001803

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Abstract

A new method for fabrication of diffractive structures, which we call quasi-direct writing, is illustrated. The diffractive structures can be generated by changing the pixel spacing along the direction of the cross scan (with zero overlap) and keeping the pixel spacing constant along the other scan direction, with a normal overlap of 50%–60%, while the substrate surface is scanned with a focused ion beam (FIB). Quasi-direct writing is a method for achieving special customer designs when the milling machine has no computer programming function. Diffractive structures with various periods and depths can be derived by controlling the parameters of pixel spacing, beam current, ion incidence angle, and the scan time or ion dose. The method is not restricted to any one material and can be used for metals, insulators, and semiconductors.

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Research Papers

History
Original Manuscript: March 22, 2004
Revised Manuscript: April 5, 2004
Published: May 3, 2004

Citation
Yongqi Fu, Ngoi Bryan, and Wei Zhou, "Quasi-direct writing of diffractive structures with a focused ion beam," Opt. Express 12, 1803-1809 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-9-1803

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References

Andrei Y. Smuk and Nabil M. Lawandy, �??Direct laser writing diffractive optics in glass,�?? Opt. Lett. 22, 1030 (1997). [CrossRef] [PubMed]
Michael T.Gale, Markus Rossi, Jorn Pedersen, and Helmut Schutz, �??Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresists,�?? Opt. Eng. 33, 3556 (1994). [CrossRef]
T. Fujita, H. Nishihara, and J. Koyama, �??Fabrication of microlenses using electron-beam lithography,�?? Opt. Lett. 6, 613 (1981). [CrossRef] [PubMed]
Fu Yong-Qi and Ngoi Kok Ann Bryan, �??Diffractive optical elements with continuous relief fabricated by focused ion beam for monomode fiber coupling,�?? Opt. Express 7, 141-147 (2000). <a href="http://www.opticsexpress.org/abstract.cfm?URI=OPEX-7-3-141.">http://www.opticsexpress.org/abstract.cfm?URI=OPEX-7-3-141.</a> [CrossRef] [PubMed]
Yongqi Fu and Ngoi Kok Ann Bryan, �??Hybrid micro-diffractive-refractive optical element with continuous relief fabricated by focused ion beam for single-mode coupling,�?? Appl. Opt. 40, 5872 (2001). [CrossRef]
Yongqi Fu and Ngoi Kok Ann Bryan, �??Self-organized formation of a blaze grating like structure on Si(100) induced by focused ion beam scanning,�?? Opt. Express 12, 227 (2004). <a href="http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-2-227">http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-2-227</a> [CrossRef] [PubMed]

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