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Fabrication of a high-resolution periodical structure using a replication process

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Abstract

We describe a procedure for rapidly and conveniently prototyping a periodic structure at submicrometer order using holographic interferometry and micro-molding processes. In this experiment, the master of the periodic structure was created on an i-line submicrometer positive photoresist film by a holographic interference using a He-Cd (325nm) laser. A subsequent mold using polydimethylsiloxane (PDMS) polymer was cast against this master and used as a stamp to transfer the grating pattern onto a UV cure epoxy. The technique shows accurate control for the transferring of a grating’s period and depth. The grating pattern on the epoxy produced by the PDMS mold shows an average of less than 2% error in the grating period and an average of 15% error in depth reproduction.

©2005 Optical Society of America

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Figures (7)

Fig. 1.
Fig. 1. Experiment setup for the holographic interferometric grating exposure.
Fig. 2.
Fig. 2. Grating depth as a function of light exposing time on photoresist. (The combined intensity of two incident beams is 15μW for all experiments.)
Fig. 3.
Fig. 3. The AFM picture and measurement result for the grating on photoresist (a) 500 nm grating period and (b) 700 nm grating period.
Fig. 4.
Fig. 4. The AFM micrograph of gratings on PDMS mold (490 nm grating period).
Fig. 5.
Fig. 5. Schematic illustration of the polymer grating fabrication by a PDMS mold.
Fig. 6.
Fig. 6. The SEM micrograph of gratings on PDMS (500 nm grating period). Some fins are stuck together as shown in the figure.
Fig. 7.
Fig. 7. The SEM micrograph of gratings on UV polymer (700 nm grating period).

Tables (1)

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Table 1. The results of gratings from the SEM and AFM measurement on photoresist (PR), PDMS, and UV polymers.

Equations (2)

Equations on this page are rendered with MathJax. Learn more.

T = λ sin θ 1 + sin θ 2 ,
Δ T T = cos θ 1 sin θ 2 + sin θ 1 × Δ θ 1 ,
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