Super-resolution imaging through a planar silver layer

doi:10.1364/OPEX.13.002127

Optics Express

Editor: Michael Duncan
Vol. 13, Iss. 6 — Mar. 21, 2005
pp: 2127–2134

Super-resolution imaging through a planar silver layer

David Melville and Richard Blaikie »View Author Affiliations

Optics Express, Vol. 13, Issue 6, pp. 2127-2134 (2005)
http://dx.doi.org/10.1364/OPEX.13.002127

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Abstract

It has been proposed that a planar silver layer could be used to project a super-resolution image in the near field when illuminated near its plasma frequency [J. B. Pendry, Phys. Rev. Lett. 86, 3966 (2000)]. This has been investigated experimentally using a modified form of conformal-mask photolithography, where dielectric spacers and silver layers are coated onto a tungsten-on-glass mask. We report here on the experimental confirmation that super-resolution imaging can be achieved using a 50-nm thick planar silver layer as a near-field lens at wavelengths around 365 nm. Gratings with periods down to 145 nm have been resolved, which agrees well with our finite-difference time domain (FDTD) simulations.

OCIS Codes
(100.6640) Image processing : Superresolution
(110.5220) Imaging systems : Photolithography
(240.6680) Optics at surfaces : Surface plasmons
(260.3910) Physical optics : Metal optics

ToC Category:
Research Papers

History
Original Manuscript: February 7, 2005
Revised Manuscript: March 7, 2005
Published: March 21, 2005

Citation
David Melville and Richard Blaikie, "Super-resolution imaging through a planar silver layer," Opt. Express 13, 2127-2134 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-6-2127

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References

J. B. Pendry, �??Negative refraction makes a perfect lens,�?? Phys. Rev. Lett. 85, 3966�??3969 (2000). [CrossRef] [PubMed]
R. A. Shelby, D. R. Smith and S. Schultz, �??Experimental verification of a negative index of refraction,�?? Science 292, 77�??79 (2001). [CrossRef] [PubMed]
A. N. Lagarkov and V. N. Kissel, �??Near-perfect imaging in a focusing system based on a left-handed-material plate,�?? Phys. Rev. Lett. 92, art. no. 077401 (2004). [CrossRef] [PubMed]
D. O. S. Melville, R. J. Blaikie and C. R. Wolf, �??Submicron imaging with a planar silver lens,�?? Appl. Phys. Lett. 84, 4403�??4405 (2004). [CrossRef]
R. J. Blaikie and D. O. S. Melville, �??Imaging through planar silver lenses in the optical near field,�?? J. Opt. A: Pure Appl. Opt. 7, S176�??S183 (2005). [CrossRef]
M. M. Alkaisi, R. J. Blaikie, S. J. McNab, R. Cheung and D. R. S. Cumming, �??Sub-diffraction-limited patterning using evanescent near-field optical lithography,�?? Appl. Phys. Lett. 75, 3560�??3562 (1999). [CrossRef]
X. G. Luo and T. Ishihara, �??Subwavelength photolithography based on surface-plasmon polariton resonance,�?? Opt. Express 12, 3055�??3065 (2004), <a href= "http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-14-3055">http://www.opticsexpress.org/abstract.cfm?URI=OPEX-12-14-3055</a>. [CrossRef] [PubMed]
H. F. Talbot, �??Facts relating to optical science,�?? Phil. Mag. 9, 401�??407 (1836).

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