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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 12, Iss. 11 — May. 31, 2004
  • pp: 2501–2506

Deposition and characterization of germanium sulphide glass planar waveguides

C. C. Huang, D. W. Hewak, and J. V. Badding  »View Author Affiliations


Optics Express, Vol. 12, Issue 11, pp. 2501-2506 (2004)
http://dx.doi.org/10.1364/OPEX.12.002501


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Abstract

Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12 µm/hr at 500°C. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5µm to 7µm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.

© 2004 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(220.4610) Optical design and fabrication : Optical fabrication

ToC Category:
Research Papers

History
Original Manuscript: March 26, 2004
Revised Manuscript: May 14, 2004
Published: May 30, 2004

Citation
C.C. Huang, D. Hewak, and J. Badding, "Deposition and characterization of germanium sulphide glass planar waveguides," Opt. Express 12, 2501-2506 (2004)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-12-11-2501


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