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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 11 — May. 30, 2005
  • pp: 3983–3988

Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser

F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C. S. Menoni, M. C. Marconi, J. J. Rocca, W. Chao, J. A. Liddle, E. H. Anderson, D. T. Attwood, A. V. Vinogradov, I. A. Artioukov, Y. P. Pershyn, and V. V. Kondratenko  »View Author Affiliations

Optics Express, Vol. 13, Issue 11, pp. 3983-3988 (2005)

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We report the demonstration of reflection mode imaging of 100 nm-scale features using 46.9 nm light from a compact capillary-discharge laser. Our imaging system employs a Sc/Si multilayer coated Schwarzschild condenser and a freestanding zone plate objective. The reported results advance the development of practical and readily available surface and nanostructure imaging tools based on the use of compact sources of extreme ultraviolet light.

© 2005 Optical Society of America

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.7460) Microscopy : X-ray microscopy

ToC Category:
Research Papers

Original Manuscript: March 2, 2005
Revised Manuscript: May 13, 2005
Published: May 30, 2005

F. Brizuela, G. Vaschenko, C. Brewer, M. Grisham, C. Menoni, M. Marconi, J. Rocca, W. Chao, J. Liddle, E. Anderson, D. Attwood, A. Vinogradov, I. Artioukov, Y. Pershyn, and V. Kondratenko, "Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser," Opt. Express 13, 3983-3988 (2005)

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  1. Y. Garini, B. J. Vermolen, and I. T. Young, �??From micro to nano: recent advances in high-resolution microscopy,�?? Current Opinion in Biotechnology 16, 3-12 (2005). [CrossRef] [PubMed]
  2. W. Chao, E. Anderson, G. P. Denbeaux, B. Harteneck, J. A. Liddle, D. L. Olynick, A. L. Pearson, F. Salmassi, C. Y. Song, and D. T. Attwood, �??20-nm-resolution soft x-ray microscopy demonstrated by use of multilayer test structures,�?? Opt. Lett. 28, 2019-2021 (2003). [CrossRef] [PubMed]
  3. M. Weiland, Ch. Spielmann, U. Kleineberg, Th. Westerwalbesloh, U. Heinzmann, and T. Wilhein, �??Towards time-resolved soft X-ray microscopy using pulsed fs-high-harmonic radiation,�?? Ultramicoscopy 102, 93-100 (2005). [CrossRef]
  4. A. R. Libertun, X. Zhang, A. Paul, D. Raymondson, E. Gershgoren, E. Gagnon, S. Backus, M. M. Murnane, H. C. Kapteyn, R. A. Bartels, Y. Liu, and D. T. Attwood, �??High-resolution EUV imaging using high harmonic generation,�?? Conference on Lasers and Electro-Optics Technical Digest, Article JMD4 (2004).
  5. J. A.Trail and R. L. Byer, �??Compact scanning soft-x-ray microscope using a laser-produced plasma source and normal-incidence multilayer mirrors,�?? Opt. Lett. 14, 539-541 (1989). [CrossRef] [PubMed]
  6. I. A. Artioukov, A. V. Vinogradov, V. E. Asadchikov, Y. S. Kasyanov, R. V. Serov, A. I. Fedorenko, V. V. Kondratenko, and S. Y. Yulin, �??Schwartzschild soft-x-ray microscope for imaging of nonradiating objects,�?? Opt. Lett. 20, 2451-2453 (1995). [CrossRef] [PubMed]
  7. G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, H. Mancini, C. S. Menoni, M. Marconi, and J. J. Rocca, �??Nano-imaging with a compact extreme ultraviolet laser,�?? Opt. Lett. in press (2005).
  8. D. S. DiCicco, D. Kim, R. Rosser, and S. Suckewer, �??First stage in the development of a soft-x-ray reflection imaging microscope in the Schwarzschild configuration using a soft-x-ray laser at 18.2 nm,�?? Opt. Lett. 17, 157-159 (1992). [CrossRef] [PubMed]
  9. T. Haga, H. Kinoshita, K. Hamamoto, S. Takada, N. Kazui, S. Kakunai, H. Tsubakino, and T. Watanabe, �??Evaluation of finished extreme ultraviolet lithography (EUVL) masks using a EUV microscope,�?? Jpn. J. Appl. Phys. 42, 3771-3775 (2003). [CrossRef]
  10. P. P. Naulleau, "Advanced EUV Lithography Capabilities at Lawrence Berkeley National Laboratory's Advanced Light Source," Proceedings, SEMI Technology Symposium 2004; P. P. Naulleau, K. A. Goldberg, E. H. Anderson, P. Denham, B. Hoef, K. Jackson, A. Morlens, and S. Rekawa, �??EUV microexposures at the ALS using the 0.3-NA MET projection optics,�?? Microlithography 2005, paper [5751-04]. i.b. Procc. SPIE 5374, 881-91 (2004). [CrossRef]
  11. Yu. A. Uspenskii, V. E. Lavashov, A. V. Vinogradov, A. I. Fedorenko, V. V. Kondratenko, Yu. P. Pershin, E. N. Zubarev, and V. Yu. Fedotov, �??High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35-50 nm,�?? Opt. Lett. 23, 771-773 (1998). [CrossRef]
  12. B. R. Benware, C. D. Macchietto, C. H. Moreno, and J. J. Rocca, �??Demonstration of a high average power tabletop soft x-ray laser,�?? Phys. Rev. Lett. 81, 5804-5807 (1998). [CrossRef]
  13. Y. Liu, M. Seminario, F. G. Tomasel, C. Chang, J. J. Rocca, and D. T. Attwood, �??Achievement of essentially full spatial coherence in a high-average-power soft-x-ray laser,�?? Phys. Rev. A 63, 033802 (2001). [CrossRef]
  14. Y. Wang, M.A. Larotonda, B.M. Luther, D. Alessi, M. Berrill, V.N. Shlyaptsev, and J.J. Rocca, �??Demonstration of saturated high repetition rate tabletop soft x-ray lasers at wavelength down to 13.9 nm�??, to be published, (2005).

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