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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 13 — Jun. 27, 2005
  • pp: 4922–4930

Near-infrared double negative metamaterials

Shuang Zhang, Wenjun Fan, K. J. Malloy, S. R. J. Brueck, N. C. Panoiu, and R. M. Osgood  »View Author Affiliations


Optics Express, Vol. 13, Issue 13, pp. 4922-4930 (2005)
http://dx.doi.org/10.1364/OPEX.13.004922


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Abstract

We numerically demonstrate a metamaterial with both negative ε and negative µ over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with standard semiconductor processing techniques.

© 2005 Optical Society of America

OCIS Codes
(260.2030) Physical optics : Dispersion
(290.3030) Scattering : Index measurements
(310.6860) Thin films : Thin films, optical properties

ToC Category:
Research Papers

History
Original Manuscript: April 29, 2005
Revised Manuscript: June 10, 2005
Published: June 27, 2005

Citation
Shuang Zhang, Wenjun Fan, K. J. Malloy, S.R. Brueck, N. C. Panoiu, and R. M. Osgood, "Near-infrared double negative metamaterials," Opt. Express 13, 4922-4930 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-13-4922


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