Near-infrared double negative metamaterials
Optics Express, Vol. 13, Issue 13, pp. 4922-4930 (2005)
http://dx.doi.org/10.1364/OPEX.13.004922
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Abstract
We numerically demonstrate a metamaterial with both negative ε and negative µ over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with standard semiconductor processing techniques.
© 2005 Optical Society of America
OCIS Codes
(260.2030) Physical optics : Dispersion
(290.3030) Scattering : Index measurements
(310.6860) Thin films : Thin films, optical properties
ToC Category:
Research Papers
History
Original Manuscript: April 29, 2005
Revised Manuscript: June 10, 2005
Published: June 27, 2005
Citation
Shuang Zhang, Wenjun Fan, K. J. Malloy, S.R. Brueck, N. C. Panoiu, and R. M. Osgood, "Near-infrared double negative metamaterials," Opt. Express 13, 4922-4930 (2005)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-13-13-4922
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