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Optics Express

Optics Express

  • Editor: Michael Duncan
  • Vol. 13, Iss. 18 — Sep. 5, 2005
  • pp: 7070–7075

Mathematical model of spin-coated photoresist on a spherical substrate

Xiao-guo Feng and Lian-chun Sun  »View Author Affiliations

Optics Express, Vol. 13, Issue 18, pp. 7070-7075 (2005)

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We present the final film thickness�?? expression of spin-coated photoresist on a spherical substrate. Firstly, some reasonable assumptions are put forward for a concise derivation process. Then, on the basis of the motion equation of spin-coated photoresist on a plane, considering the spherical surface shape, we put forward the motion equation of spin-coated photoresist on a spherical substrate. So two evolution equations of film thickness and radial position are derived, and the expression of initial film thickness evolution in a radial position is also gained. Finally, considering some effects of solvent volatilization, we gain the expression of final film thickness. The experiment result indicates that the expression is accurate.

© 2005 Optical Society of America

OCIS Codes
(220.4000) Optical design and fabrication : Microstructure fabrication
(310.0310) Thin films : Thin films
(310.1620) Thin films : Interference coatings

ToC Category:
Research Papers

Original Manuscript: July 26, 2005
Revised Manuscript: August 26, 2005
Published: September 5, 2005

Xiao-guo Feng and Lian-chun Sun, "Mathematical model of spin-coated photoresist on a spherical substrate," Opt. Express 13, 7070-7075 (2005)

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