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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 20 — Oct. 1, 2007
  • pp: 12872–12881

Crossing and branching nodes in soft-lithography-based optical interconnects

Wei Ni, Jing Wu, and X. Wu  »View Author Affiliations


Optics Express, Vol. 15, Issue 20, pp. 12872-12881 (2007)
http://dx.doi.org/10.1364/OE.15.012872


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Abstract

We investigate the characteristics of crossing and branching nodes in monolayer soft-lithography-based polymer optical interconnects with experimental and theoretical analysis. The theoretical crosstalk, as calculated by a function of crossing angle, was determined for a set of interconnect pairs with varying cross-sections, and was compared with experimental measurements. Furthermore, a suitable branching angle was found for branching node and the effects of short-distance mode scrambling in highly multimode polymer waveguides were studied in detail. It was found that mode-filling occurred within a propagation distance of 1.5mm for a 50×50μm2 cross-section for VCSEL coupling; however, complete scrambling of ray direction required a propagation distance of more than 5 mm.

© 2007 Optical Society of America

OCIS Codes
(200.4650) Optics in computing : Optical interconnects
(250.5300) Optoelectronics : Photonic integrated circuits
(250.5460) Optoelectronics : Polymer waveguides

ToC Category:
Optoelectronics

History
Original Manuscript: August 16, 2007
Revised Manuscript: September 5, 2007
Manuscript Accepted: September 6, 2007
Published: September 21, 2007

Citation
Wei Ni, Jing Wu, and X. Wu, "Crossing and branching nodes in soft-lithography-based optical interconnects," Opt. Express 15, 12872-12881 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-20-12872


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