Sub-micron periodic structuring of sapphire by
laser induced backside wet etching technique

doi:10.1364/OE.15.001428

Sub-micron periodic structuring of sapphire by laser induced backside wet etching technique

Stavros Pissadakis, Rico Böhme, and Klaus Zimmer »View Author Affiliations

Optics Express, Vol. 15, Issue 4, pp. 1428-1433 (2007)
http://dx.doi.org/10.1364/OE.15.001428

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Abstract

The periodic structuring of sapphire, by using laser induced backside wet etching technique (LIBWE) and 266 nm, 150 ps Nd:YAG laser radiation, is demonstrated here for first time. Sub-micron period Bragg reflectors are successfully patterned in sapphire wafers using modest energy densities and number of pulses. The gratings are characterized using diffraction efficiency measurements, AFM, and SEM. Issues related to the ablation process and to the phase mask holography are presented and discussed. The experimental results presented depict that the applied method is capable to produce relief structures of depth as deep as 100 nm, while maintaining high resolutions, close to the thermal diffusion length of the material corresponding to the ultrashort pulse duration.

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(160.4670) Materials : Optical materials
(220.4000) Optical design and fabrication : Microstructure fabrication

ToC Category:
Diffraction and Gratings

History
Original Manuscript: December 21, 2006
Revised Manuscript: January 24, 2007
Manuscript Accepted: January 24, 2007
Published: February 19, 2007

Citation
Stavros Pissadakis, Rico Böhme, and Klaus Zimmer, "Sub-micron periodic structuring of sapphire by laser induced backside wet etching technique," Opt. Express 15, 1428-1433 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-4-1428

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References

J. Wang, H. Niino, and A. Yabe, "Micromachining of transparent materials with super-heated liquid generated by multiphotonic absorption of organic molecule," Appl. Surf. Sci. 154, 571-576 (2000). [CrossRef]
R. Böhme, A. Braun, and K. Zimmer, "Backside etching of UV-transparent materials at the interface to liquids, " Appl. Surf. Sci. 186, 276-281 (2002). [CrossRef]
G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials, " Thin Solid Films 453-454, 31-35 (2004).
R. Böhme, S. Pissadakis, M. Ehrhardt, D. Ruthe, and K. Zimmer, "Ultra-short laser processing of transparent material at the interface to liquid," J. Phys. D 39, 1398-1404 (2006) [CrossRef]
K. Zimmer, A. Braun, R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208, 199-204 (2003). [CrossRef]
C. Vass, K. Osvay, and B. Hopp, "Fabrication of 150 nm period grating in fused silica by two-beam interferometric laser induced backside wet etching method," Opt. Express 14, 8354-8359 (2006) [CrossRef] [PubMed]
L. M. B. Hickey, V. Apostolopoulos, R. W. Eason, J. S. Wilkinson, and A. A. Anderson, "Diffused Ti:sapphire channel-waveguide lasers," J. Opt. Soc. Am. B 21, 1452-1462 (2004). [CrossRef]
A. C. Tam, J. L. Brand, D. C. Cheng, and W. Zapka, "Picosecond laser sputtering of sapphire at 266 nm," Appl. Phys. Lett. 55, 2045-2047 (1989). [CrossRef]
D. Ashkenasi, A. Rosenfeld, H. Varel, M. Wähmer and E. E. B. Campbell, "Laser processing of sapphire with picosecond and sub-picosecond pulses," Appl. Surf. Sc. 120, 65-80 (1997). [CrossRef]
X. M. Ding, T. Sato, Y. Kawaguchi, and H. Niino: "Laser-induced backside wet etching of sapphire," Jpn. J. Appl. Phys. 42 (2B), 176-178 (2003). [CrossRef]
H. M. Smith ed., Holographic recording materials, (Springer-Verlag 1977) Vol. 20. [CrossRef]
S. Pissadakis, L. Reekie, M. Hempstead, M. N. Zervas, and J. S. Wilkinson, "Ablated gratings on borosilicate glass by 193nm excimer laser radiation," Appl. Phys. A 69, S739-S741 (1999). [CrossRef]
S. Pissadakis, L. Reekie, M. N. Zervas, and J. S. Wilkinson, "Sub-micron period relief gratings in InOx thin films and waveguides, patterned using 248nm excimer laser ablation," J. Appl. Phys. 95, 1634-1641 (2004). [CrossRef]
R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005). [CrossRef]
Z. Xiong, G. D. Peng, B. Wu, and P. L. Chu, "Effects of the Zeroth-Order Diffraction of a Phase Mask on Bragg Gratings," J. Lightwave Technol. 17, 2361 (1999). [CrossRef]
P. E. Dyer, R. J. Farley, and R. Giedl, "Effects of the Zeroth-Order Diffraction of a Phase Mask on Bragg Gratings," Appl. Phys. Lett. 64, 3389-3391 (1994). [CrossRef]
K. Zimmer, "Studies on the laser-induced temperatures at solid liquid material interface," in preparation.
R. Böhme, S. Pissadakis, S. Ruthe, and K. Zimmer, "Laser backside etching of fused silica with ultrashort pulses," Appl. Phys. A 85, 75-78 (2006). [CrossRef]
CRC, Handbook of Chemistry and Physics, 80th Edition (1999-2000).

Appl. Phys. A

S. Pissadakis, L. Reekie, M. Hempstead, M. N. Zervas, and J. S. Wilkinson, "Ablated gratings on borosilicate glass by 193nm excimer laser radiation," Appl. Phys. A 69, S739-S741 (1999). [CrossRef]
R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005). [CrossRef]
R. Böhme, S. Pissadakis, S. Ruthe, and K. Zimmer, "Laser backside etching of fused silica with ultrashort pulses," Appl. Phys. A 85, 75-78 (2006). [CrossRef]

Appl. Phys. Lett.

P. E. Dyer, R. J. Farley, and R. Giedl, "Effects of the Zeroth-Order Diffraction of a Phase Mask on Bragg Gratings," Appl. Phys. Lett. 64, 3389-3391 (1994). [CrossRef]
A. C. Tam, J. L. Brand, D. C. Cheng, and W. Zapka, "Picosecond laser sputtering of sapphire at 266 nm," Appl. Phys. Lett. 55, 2045-2047 (1989). [CrossRef]

Appl. Surf. Sc.

D. Ashkenasi, A. Rosenfeld, H. Varel, M. Wähmer and E. E. B. Campbell, "Laser processing of sapphire with picosecond and sub-picosecond pulses," Appl. Surf. Sc. 120, 65-80 (1997). [CrossRef]

Appl. Surf. Sci.

J. Wang, H. Niino, and A. Yabe, "Micromachining of transparent materials with super-heated liquid generated by multiphotonic absorption of organic molecule," Appl. Surf. Sci. 154, 571-576 (2000). [CrossRef]
R. Böhme, A. Braun, and K. Zimmer, "Backside etching of UV-transparent materials at the interface to liquids, " Appl. Surf. Sci. 186, 276-281 (2002). [CrossRef]
K. Zimmer, A. Braun, R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208, 199-204 (2003). [CrossRef]

J. Appl. Phys.

S. Pissadakis, L. Reekie, M. N. Zervas, and J. S. Wilkinson, "Sub-micron period relief gratings in InOx thin films and waveguides, patterned using 248nm excimer laser ablation," J. Appl. Phys. 95, 1634-1641 (2004). [CrossRef]

J. Lightwave Technol.

Z. Xiong, G. D. Peng, B. Wu, and P. L. Chu, "Effects of the Zeroth-Order Diffraction of a Phase Mask on Bragg Gratings," J. Lightwave Technol. 17, 2361 (1999). [CrossRef]

J. Opt. Soc. Am. B

L. M. B. Hickey, V. Apostolopoulos, R. W. Eason, J. S. Wilkinson, and A. A. Anderson, "Diffused Ti:sapphire channel-waveguide lasers," J. Opt. Soc. Am. B 21, 1452-1462 (2004). [CrossRef]

J. Phys. D

R. Böhme, S. Pissadakis, M. Ehrhardt, D. Ruthe, and K. Zimmer, "Ultra-short laser processing of transparent material at the interface to liquid," J. Phys. D 39, 1398-1404 (2006) [CrossRef]

Jpn. J. Appl. Phys.

X. M. Ding, T. Sato, Y. Kawaguchi, and H. Niino: "Laser-induced backside wet etching of sapphire," Jpn. J. Appl. Phys. 42 (2B), 176-178 (2003). [CrossRef]

Opt. Express

C. Vass, K. Osvay, and B. Hopp, "Fabrication of 150 nm period grating in fused silica by two-beam interferometric laser induced backside wet etching method," Opt. Express 14, 8354-8359 (2006) [CrossRef] [PubMed]

Thin Solid Films

G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials, " Thin Solid Films 453-454, 31-35 (2004).

Other

H. M. Smith ed., Holographic recording materials, (Springer-Verlag 1977) Vol. 20. [CrossRef]
K. Zimmer, "Studies on the laser-induced temperatures at solid liquid material interface," in preparation.
CRC, Handbook of Chemistry and Physics, 80th Edition (1999-2000).

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[1] J. Wang, H. Niino, and A. Yabe, "Micromachining of transparent materials with super-heated liquid generated by multiphotonic absorption of organic molecule," Appl. Surf. Sci. 154, 571-576 (2000). [CrossRef]

[2] R. Böhme, A. Braun, and K. Zimmer, "Backside etching of UV-transparent materials at the interface to liquids, " Appl. Surf. Sci. 186, 276-281 (2002). [CrossRef]

[3] G. Kopitkovas, T. Lippert, C. David, A. Wokaun, and J. Gobrecht, "Surface micromachining of UV transparent materials, " Thin Solid Films 453-454, 31-35 (2004).

[4] R. Böhme, S. Pissadakis, M. Ehrhardt, D. Ruthe, and K. Zimmer, "Ultra-short laser processing of transparent material at the interface to liquid," J. Phys. D 39, 1398-1404 (2006) [CrossRef]

[5] K. Zimmer, A. Braun, R. Böhme, "Etching of fused silica and glass with excimer laser at 351 nm," Appl. Surf. Sci. 208, 199-204 (2003). [CrossRef]

[6] C. Vass, K. Osvay, and B. Hopp, "Fabrication of 150 nm period grating in fused silica by two-beam interferometric laser induced backside wet etching method," Opt. Express 14, 8354-8359 (2006) [CrossRef] [PubMed]

[7] L. M. B. Hickey, V. Apostolopoulos, R. W. Eason, J. S. Wilkinson, and A. A. Anderson, "Diffused Ti:sapphire channel-waveguide lasers," J. Opt. Soc. Am. B 21, 1452-1462 (2004). [CrossRef]

[8] A. C. Tam, J. L. Brand, D. C. Cheng, and W. Zapka, "Picosecond laser sputtering of sapphire at 266 nm," Appl. Phys. Lett. 55, 2045-2047 (1989). [CrossRef]

[9] D. Ashkenasi, A. Rosenfeld, H. Varel, M. Wähmer and E. E. B. Campbell, "Laser processing of sapphire with picosecond and sub-picosecond pulses," Appl. Surf. Sc. 120, 65-80 (1997). [CrossRef]

[10] X. M. Ding, T. Sato, Y. Kawaguchi, and H. Niino: "Laser-induced backside wet etching of sapphire," Jpn. J. Appl. Phys. 42 (2B), 176-178 (2003). [CrossRef]

[11] H. M. Smith ed., Holographic recording materials, (Springer-Verlag 1977) Vol. 20. [CrossRef]

[12] S. Pissadakis, L. Reekie, M. Hempstead, M. N. Zervas, and J. S. Wilkinson, "Ablated gratings on borosilicate glass by 193nm excimer laser radiation," Appl. Phys. A 69, S739-S741 (1999). [CrossRef]

[13] S. Pissadakis, L. Reekie, M. N. Zervas, and J. S. Wilkinson, "Sub-micron period relief gratings in InOx thin films and waveguides, patterned using 248nm excimer laser ablation," J. Appl. Phys. 95, 1634-1641 (2004). [CrossRef]

[14] R. Böhme, J. Zajadacz, K. Zimmer, and B. Rauschenbach, "Topography and roughness evolution of microstructured surfaces at laser-induced backside wet etching," Appl. Phys. A 80, 433-438 (2005). [CrossRef]

[15] Z. Xiong, G. D. Peng, B. Wu, and P. L. Chu, "Effects of the Zeroth-Order Diffraction of a Phase Mask on Bragg Gratings," J. Lightwave Technol. 17, 2361 (1999). [CrossRef]

[16] P. E. Dyer, R. J. Farley, and R. Giedl, "Effects of the Zeroth-Order Diffraction of a Phase Mask on Bragg Gratings," Appl. Phys. Lett. 64, 3389-3391 (1994). [CrossRef]

[17] K. Zimmer, "Studies on the laser-induced temperatures at solid liquid material interface," in preparation.

[18] R. Böhme, S. Pissadakis, S. Ruthe, and K. Zimmer, "Laser backside etching of fused silica with ultrashort pulses," Appl. Phys. A 85, 75-78 (2006). [CrossRef]

[19] CRC, Handbook of Chemistry and Physics, 80th Edition (1999-2000).

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