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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 15, Iss. 4 — Feb. 19, 2007
  • pp: 1732–1737

Modeling material saturation effects in microholographic recording

Zs. Nagy, P. Koppa, F. Ujhelyi, E. Dietz, S. Frohmann, and S. Orlic  »View Author Affiliations


Optics Express, Vol. 15, Issue 4, pp. 1732-1737 (2007)
http://dx.doi.org/10.1364/OE.15.001732


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Abstract

Microholographic data storage system model is presented that includes non-linear and non-local behavior of the storage material for accurate simulation of the system and optimization of the writing process. For the description of the photopolymer material a diffusion based nonlocal material model is used. The diffusion equation is solved numerically and the modulation of the dielectric constant is calculated. Diffraction efficiency of simulated microholograms and measurements were compared, and they show good agreement.

© 2007 Optical Society of America

OCIS Codes
(050.7330) Diffraction and gratings : Volume gratings
(090.2900) Holography : Optical storage materials
(210.0210) Optical data storage : Optical data storage
(210.2860) Optical data storage : Holographic and volume memories

ToC Category:
Optical Data Storage

History
Original Manuscript: November 22, 2006
Revised Manuscript: January 16, 2007
Manuscript Accepted: January 22, 2007
Published: February 19, 2007

Citation
Zs. Nagy, P. Koppa, F. Ujhelyi, E. Dietz, S. Frohmann, and S. Orlic, "Modeling material saturation effects in microholographic recording," Opt. Express 15, 1732-1737 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-4-1732


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References

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