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Optics Express

Optics Express

  • Editor: C. Martijin de Sterke
  • Vol. 15, Iss. 9 — Apr. 30, 2007
  • pp: 5537–5542

Porous silicon Bragg reflectors with sub-micrometer lateral dimensions

Mark B. H. Breese and Dharmalingam Mangaiyarkarasi  »View Author Affiliations


Optics Express, Vol. 15, Issue 9, pp. 5537-5542 (2007)
http://dx.doi.org/10.1364/OE.15.005537


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Abstract

Bragg reflectors with widths down to 300 nm have been fabricated in porous silicon. This was achieved by irradiation of highly-doped p-type silicon with a focused beam of high-energy ions in a channeled alignment, in which the beam is aligned with a major crystallographic direction. The reflected colour is controllably tuned across the visible spectrum by varying the ion irradiated dose. The depth distribution of ion induced defects differs in channeled alignment compared to random beam alignment, resulting in the hole current during subsequent anodisation being more confined to narrower lateral regions, enabling different reflective wavelengths to be patterned on a sub-micron lateral scale. This work provides a means of producing high-density arrays of micron-size reflective colour pixels for uses in high-definition displays, and selectively tuning the wavelengths of porous silicon Fabry-Perot microcavities across the visible and infra-red ranges for optical communications and computing applications.

© 2007 Optical Society of America

OCIS Codes
(130.0250) Integrated optics : Optoelectronics
(230.1480) Optical devices : Bragg reflectors
(230.4170) Optical devices : Multilayers

ToC Category:
Integrated Optics

History
Original Manuscript: March 20, 2007
Revised Manuscript: April 10, 2007
Manuscript Accepted: April 17, 2007
Published: April 20, 2007

Citation
Mark B. H. Breese and Dharmalingam Mangaiyarkarasi, "Porous silicon Bragg reflectors with sub-micrometer lateral dimensions," Opt. Express 15, 5537-5542 (2007)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-9-5537


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