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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 23 — Nov. 9, 2009
  • pp: 21042–21049

High resolution interferometer with multiple-pass optical configuration

Jeongho Ahn, Jong-Ahn Kim, Chu-Shik Kang, Jae-Wan Kim, and Soohyun Kim  »View Author Affiliations

Optics Express, Vol. 17, Issue 23, pp. 21042-21049 (2009)

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An interferometer having resolution fourteen times higher than a conventional single-pass interferometer has been developed by creating multiple-pass optical path. To embody the multiple-pass optical configuration, a two-dimensional corner cube array block was designed, where its symmetric structure minimized the measurement error. The effect from the alignment error and the imperfection of corner cube is calculated and is in picometer level. An experiment proves that the proposed interferometer has optical resolution of approximate 45 nm and its nonlinearity is about 0.5 nm in peak-to-valley value.

© 2009 Optical Society of America

OCIS Codes
(120.0120) Instrumentation, measurement, and metrology : Instrumentation, measurement, and metrology
(120.3180) Instrumentation, measurement, and metrology : Interferometry

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: September 8, 2009
Revised Manuscript: October 19, 2009
Manuscript Accepted: October 20, 2009
Published: November 4, 2009

Jeongho Ahn, Jong-Ahn Kim, Chu-Shik Kang, Jae-Wan Kim, and Soohyun Kim, "High resolution interferometer with multiple-pass optical configuration," Opt. Express 17, 21042-21049 (2009)

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  1. T. Ito and S. Okazaki, "Pushing the limits of lithography," Nature 406(6799), 1027-1031 (2000). [CrossRef]
  2. M. Totzeck, W. Ulrich, A. Göhnermeier and W. Kaiser, "Semiconductor fabrication - Pushing deep ultraviolet lithography to its limits," Nat. Photonics 1, 629-631 (2007). [CrossRef]
  3. M. Pisani, "Multiple reflection Michelson interferometer with picometer resolution," Opt. Express 16(26), 21558-21563, (2008). [CrossRef]
  4. H. Haitjema, P. H. J. Schellekens and S. F. C. L Wetzels, "Calibration of displacement sensors up to 300 μm with nanometer accuracy and direct traceability to a primary standard of length," Metrologia,  37, 25-33 (2000). [CrossRef]
  5. M. J. Downs and W. R. C. Rowley, "A proposed design for a polarization-insensitive optical interferometer system with subnanometric capability," Precis. Eng. 15(4), 281-286 (1993). [CrossRef]
  6. T. B. Eom, J. Y. Kim and K. Jeong, "The dynamic compensation of nonlinearity in a homodyne laser interferometer," Meas. Sci. Technol. 12, 1734-1738 (2001). [CrossRef]
  7. P. L. M. Heydemann, "Determination and correction of quadrature fringe measurement errors in interferometers," Appl. Opt. 20, 3382-3384 (1981). [CrossRef] [PubMed]
  8. EMRP T3.J1.4.NANOTRACE "New traceability routes for nanometrology," www.emrpoline.eu.
  9. B. C. Park, T. B. Eom and M. S. Chung, "Polarization properties of cube-corner retroreflectors and their effects on signal strength and nonlinearity in heterodyne interferometers," Appl. Opt. 35(22), 4372-4380 (1996). [CrossRef]
  10. G. D’Agostino, A. Germak, S. Desogus, C. Origlia and G. Barboto, "A method to estimate the time-position coordinates of a free-falling test mass in absolute gravimetry," Metrologia,  42, 233-238 (2005). [CrossRef]

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