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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 24 — Nov. 23, 2009
  • pp: 21530–21543

Fabrication of optical mosaic gratings with phase and attitude adjustments employing latent fringes and a red-wavelength dual-beam interferometer

Lei Shi, Lijiang Zeng, and Lifeng Li  »View Author Affiliations

Optics Express, Vol. 17, Issue 24, pp. 21530-21543 (2009)

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We present a method to make optical mosaic gratings that uses the exposure beams and the latent grating created by the previous exposure to adjust the lateral position and readjust the attitude of the substrate for the current exposure. As thus, it is a direct method without using any auxiliary reference grating(s) and it avoids the asynchronous drifts between otherwise independent exposure and alignment optical sub-systems. In addition, the method uses a red laser wavelength in the plane-mirror interferometers for the multi-dimensional attitude adjustment, so the adjustment can be done at leisure. The mosaic procedure is described step by step, and the principles to minimize substrate alignment errors are explained in detail. Experimentally we made several mosaics of (50 + 30) × 50 mm2 final grating area. The typical peak-valley and root-mean-square values of the measured −1st-order diffraction wavefront errors are 0.036 λ and 0.006 λ, respectively.

© 2009 OSA

OCIS Codes
(050.1950) Diffraction and gratings : Diffraction gratings
(090.2890) Holography : Holographic optical elements
(120.3180) Instrumentation, measurement, and metrology : Interferometry
(320.5520) Ultrafast optics : Pulse compression

ToC Category:
Diffraction and Gratings

Original Manuscript: September 1, 2009
Revised Manuscript: October 29, 2009
Manuscript Accepted: November 1, 2009
Published: November 10, 2009

Lei Shi, Lijiang Zeng, and Lifeng Li, "Fabrication of optical mosaic gratings with phase and attitude adjustments employing latent fringes and a red-wavelength dual-beam interferometer," Opt. Express 17, 21530-21543 (2009)

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  1. J. D. Zuegel, S. Borneis, C. Barty, B. Legarrec, C. Danson, N. Miyanaga, P. K. Rambo, C. Leblanc, T. J. Kessler, A. W. Schmid, L. J. Waxer, J. H. Kelly, B. Kruschwitz, R. Jungquist, E. Moses, J. Britten, I. Jovanovic, J. Dawson, and N. Blanchot, “Laser challenges for fast ignition,” Fusion Sci. Technol. 49, 453–482 (2006).
  2. J. Qiao, A. Kalb, M. J. Guardalben, G. King, D. Canning, and J. H. Kelly, “Large-aperture grating tiling by interferometry for petawatt chirped-pulse-amplification systems,” Opt. Express 15(15), 9562–9574 (2007), http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-15-15-9562 . [CrossRef] [PubMed]
  3. M. L. Schattenburg, C. G. Chen, R. K. Heilmann, P. T. Konkola, and G. S. Pati, “Progress towards a general grating patterning technology using phase-locked scanning beams,” Proc. SPIE 4485, 61–67 (2001).
  4. T. Jitsuno, S. Motokoshi, T. Okamoto, T. Mikami, D. Smith, M. L. Schattenburg, H. Kitamura, H. Matsuo, T. Kawasaki, K. Kondo, H. Shiraga, Y. Nakata, H. Habara, K. Tsubakimoto, R. Kodama, K. A. Tanaka, N. Miyanaga, and K. Mima, “Development of 91 cm size gratings and mirrors for LEFX laser system,” in the fifth International Conference on Inertial Fusion Sciences and Applications, (Kobe, Japan, 2007). http://www.iop.org/EJ/abstract/1742-6596/112/3/032002
  5. B. G. Turukhano, V. P. Gorelik, S. N. Kovalenko, and N. Turukhano, “Phase synthesis of a holographic metrological diffraction grating of unlimited length,” Opt. Laser Technol. 28(4), 263–268 (1996). [CrossRef]
  6. L. Zeng and L. Li, “Optical mosaic gratings made by consecutive, phase-interlocked, holographic exposures using diffraction from latent fringes,” Opt. Lett. 32(9), 1081–1083 (2007). [CrossRef] [PubMed]
  7. L. M. Milner, K. C. Hickman, S. M. Gaspar, K. P. Bishop, S. S. H. Naqvi, and J. R. McNeil, “Latent image exposure monitor using scatterometry,” Proc. SPIE 1673, 274–283 (1992). [CrossRef]

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