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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 17, Iss. 6 — Mar. 16, 2009
  • pp: 4646–4651

Broadband antireflective poly-Si nanosponge for thin film solar cells

J. Y. Chyan, W. C. Hsu, and J. A. Yeh  »View Author Affiliations


Optics Express, Vol. 17, Issue 6, pp. 4646-4651 (2009)
http://dx.doi.org/10.1364/OE.17.004646


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Abstract

Antireflective nanosponges are fabricated on poly crystalline silicon (poly-Si) thin films using Ag-nanoparticles (NPs) assisted etching. Crystal orientations and grain sizes of the poly-Si thin films are investigated for the poly-Si nanosponge formation and the resultant optical properties. The Ag-NPs assisted etching preferentially etches the poly-Si thin films along crystal orientation of [110]. A 400 nm thick poly-Si nanosponge reduces effective optical reflection of the poly-Si thin film with substrate crystal orientation of (110) and averaged grain size of 250 nm from 26 % to 3 % at the wavelengths ranging from 400 nm to 1000 nm. Carrier lifetimes were found to be 41 and 36 μs for poly-Si thin film and RTO-passivated nanosponges, respectively.

© 2009 Optical Society of America

OCIS Codes
(160.4670) Materials : Optical materials
(350.6050) Other areas of optics : Solar energy
(220.4241) Optical design and fabrication : Nanostructure fabrication
(310.6628) Thin films : Subwavelength structures, nanostructures
(310.6845) Thin films : Thin film devices and applications

ToC Category:
Thin Films

History
Original Manuscript: January 22, 2009
Revised Manuscript: March 5, 2009
Manuscript Accepted: March 5, 2009
Published: March 9, 2009

Citation
J. Y. Chyan, W. C. Hsu, and J. A. Yeh, "Broadband antireflective poly-Si nanosponge for thin film solar cells," Opt. Express 17, 4646-4651 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-6-4646


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