Effect of surface manufacturing error of cubic phase mask in wavefront coding system

doi:10.1364/OE.17.006245

Effect of surface manufacturing error of cubic phase mask in wavefront coding system

Chuan-Chung Chang and Cheng-Chung Lee »View Author Affiliations

Optics Express, Vol. 17, Issue 8, pp. 6245-6251 (2009)
http://dx.doi.org/10.1364/OE.17.006245

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Abstract
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Abstract

The degenerated performance of extend depth of field (EDoF) in wavefront coding system which using cubic phase mask is simulated. A periodical rotationally symmetric surface error structure is presented and combined with comparison the similarity of point spread function (PSF). The peak to valley (PV) error of the cubic surface is needed smaller than 15% compare with the sag of the cubic surface for low period error existed.

OCIS Codes
(110.0110) Imaging systems : Imaging systems
(220.0220) Optical design and fabrication : Optical design and fabrication
(240.0240) Optics at surfaces : Optics at surfaces

ToC Category:
Imaging Systems

History
Original Manuscript: March 9, 2009
Revised Manuscript: March 27, 2009
Manuscript Accepted: March 28, 2009
Published: April 1, 2009

Citation
Chuan-Chung Chang and Cheng-Chung Lee, "Effect of surface manufacturing error of cubic phase mask in wavefront coding system," Opt. Express 17, 6245-6251 (2009)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-17-8-6245

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References

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