Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

doi:10.1364/OE.18.014467

Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

Fernando Brizuela, Sergio Carbajo, Anne Sakdinawat, David Alessi, Dale H. Martz, Yong Wang, Bradley Luther, Kenneth A. Goldberg, Iacopo Mochi, David T. Attwood, Bruno La Fontaine, Jorge J. Rocca, and Carmen S. Menoni »View Author Affiliations

Optics Express, Vol. 18, Issue 14, pp. 14467-14473 (2010)
http://dx.doi.org/10.1364/OE.18.014467

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Abstract

We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.7460) Microscopy : X-ray microscopy

ToC Category:
Microscopy

History
Original Manuscript: April 12, 2010
Revised Manuscript: June 18, 2010
Manuscript Accepted: June 18, 2010
Published: June 22, 2010

Citation
Fernando Brizuela, Sergio Carbajo, Anne Sakdinawat, David Alessi, Dale H. Martz, Yong Wang, Bradley Luther, Kenneth A. Goldberg, Iacopo Mochi, David T. Attwood, Bruno La Fontaine, Jorge J. Rocca, and Carmen S. Menoni, "Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks," Opt. Express 18, 14467-14473 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-14-14467

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References

S. Yook, H. Fissan, C. Asbach, J. H. Kim, D. D. Dutcher, P.-Y. Yan, and D. Y. H. Pui, “Experimental Investigations on Particle Contamination fo Masks Without Protective Pellicles During Vibration or Shipping of Mask Carriers,” IEEE Trans. Semicond. Manuf. 20(4), 578–584 (2007). [CrossRef]
K. A. Goldberg, A. Barty, Y. Liu, P. A. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. I. Wood, “Actinic inspection of extreme ultraviolet programmed multilayer defects and cross-comparison measurements,” J. Vac. Sci. Technol. B 24(6), 2824–2828 (2006). [CrossRef]
A. Barty, J. S. Taylor, R. Hudima, E. Spiller, D. W. Sweeney, G. Shelden, and J.-P. Urbach, “Aerial Image Microscopes for the inspection of defects in EUV masks,” in 22nd Annual BACUS Symposium on Photomask Techology, Proceedings of SPIE, 2002), 0277–0786X/0202.
K. A. Goldberg, P. P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, and S. Huh, “Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture,” J. Vac. Sci. Technol. B 26(6), 2220–2224 (2008). [CrossRef]
M. Osugi, K. Tanaka, N. Sakaya, K. Hamamoto, T. Watanabe, and H. Kinoshita, “Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter,” Jpn. J. Appl. Phys. 47(6), 4872–4877 (2008). [CrossRef]
G. Vaschenko, C. Brewer, F. Brizuela, Y. Wang, M. A. Larotonda, B. M. Luther, M. C. Marconi, J. J. Rocca, C. S. Menoni, E. H. Anderson, W. Chao, B. D. Harteneck, J. A. Liddle, Y. Liu, and D. T. Attwood, “Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light,” Opt. Lett. 31(9), 1214–1216 (2006). [CrossRef] [PubMed]
F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, “Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination,” Opt. Lett. 34(3), 271–273 (2009). [CrossRef] [PubMed]
J. J. Rocca, Y. Wang, M. A. Larotonda, B. M. Luther, M. Berrill, and D. Alessi, “Saturated 13.2 nm high-repetition-rate laser in nickellike cadmium,” Opt. Lett. 30(19), 2581–2583 (2005). [CrossRef] [PubMed]
Y. Wang, M. Larotonda, B. Luther, D. Alessi, M. Berrill, V. Shlyaptsev, and J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9 nm and gain down to 10.9 nm,” Phys. Rev. A 72(5), 053807 (2005). [CrossRef]
D. H. Martz, D. Alessi, B. M. Luther, Y. Wang, D. Kemp, M. Berrill, and J. J. Rocca, “High-energy 13.9 nm table-top soft-x-ray laser at 2.5 Hz repetition rate excited by a slab-pumped Ti:sapphire laser,” Opt. Lett. 35(10), 1632–1634 (2010). [CrossRef] [PubMed]
E. H. Anderson, “Specialized Electron Beam Nanolithography for EUV and X-Ray Diffractive Optics,” IEEE J. Quantum Electron. 42(1), 27–35 (2006). [CrossRef]
mask provided by GLOBALFOUNDRIES.
P. P. Naulleau, C. N. Anderson, J. Chiu, P. Denham, S. George, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, and G. Jones, “22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool,” Microelectron. Eng. 86(4-6), 448–455 (2009). [CrossRef]
J. M. Heck, D. T. Attwood, W. Meyer-Ilse, and E. Anderson, “Resolution determination in X-ray microscopy: an analysis of the effects of partial coherence and illumination spectrum,” J. X Ray Sci. Technol. 8, 95–104 (1998).
K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E-1-12 (2007).
SPLAT, http://cuervo2.eecs.berkeley.edu/ .
K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, and S. Huh, “Benchmarking EUV mask inspection beyond 0.25 NA,” Proc. SPIE 7122, 71222E-1 (2008).

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[1] S. Yook, H. Fissan, C. Asbach, J. H. Kim, D. D. Dutcher, P.-Y. Yan, and D. Y. H. Pui, “Experimental Investigations on Particle Contamination fo Masks Without Protective Pellicles During Vibration or Shipping of Mask Carriers,” IEEE Trans. Semicond. Manuf. 20(4), 578–584 (2007). [CrossRef]

[2] K. A. Goldberg, A. Barty, Y. Liu, P. A. Kearney, Y. Tezuka, T. Terasawa, J. S. Taylor, H.-S. Han, and O. R. I. Wood, “Actinic inspection of extreme ultraviolet programmed multilayer defects and cross-comparison measurements,” J. Vac. Sci. Technol. B 24(6), 2824–2828 (2006). [CrossRef]

[3] A. Barty, J. S. Taylor, R. Hudima, E. Spiller, D. W. Sweeney, G. Shelden, and J.-P. Urbach, “Aerial Image Microscopes for the inspection of defects in EUV masks,” in 22nd Annual BACUS Symposium on Photomask Techology, Proceedings of SPIE, 2002), 0277–0786X/0202.

[4] K. A. Goldberg, P. P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, and S. Huh, “Actinic extreme ultraviolet mask inspection beyond 0.25 numerical aperture,” J. Vac. Sci. Technol. B 26(6), 2220–2224 (2008). [CrossRef]

[5] M. Osugi, K. Tanaka, N. Sakaya, K. Hamamoto, T. Watanabe, and H. Kinoshita, “Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter,” Jpn. J. Appl. Phys. 47(6), 4872–4877 (2008). [CrossRef]

[6] G. Vaschenko, C. Brewer, F. Brizuela, Y. Wang, M. A. Larotonda, B. M. Luther, M. C. Marconi, J. J. Rocca, C. S. Menoni, E. H. Anderson, W. Chao, B. D. Harteneck, J. A. Liddle, Y. Liu, and D. T. Attwood, “Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light,” Opt. Lett. 31(9), 1214–1216 (2006). [CrossRef] [PubMed]

[7] F. Brizuela, Y. Wang, C. A. Brewer, F. Pedaci, W. Chao, E. H. Anderson, Y. Liu, K. A. Goldberg, P. P. Naulleau, P. Wachulak, M. C. Marconi, D. T. Attwood, J. J. Rocca, and C. S. Menoni, “Microscopy of extreme ultraviolet lithography masks with 13.2 nm tabletop laser illumination,” Opt. Lett. 34(3), 271–273 (2009). [CrossRef] [PubMed]

[8] J. J. Rocca, Y. Wang, M. A. Larotonda, B. M. Luther, M. Berrill, and D. Alessi, “Saturated 13.2 nm high-repetition-rate laser in nickellike cadmium,” Opt. Lett. 30(19), 2581–2583 (2005). [CrossRef] [PubMed]

[9] Y. Wang, M. Larotonda, B. Luther, D. Alessi, M. Berrill, V. Shlyaptsev, and J. Rocca, “Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9 nm and gain down to 10.9 nm,” Phys. Rev. A 72(5), 053807 (2005). [CrossRef]

[10] D. H. Martz, D. Alessi, B. M. Luther, Y. Wang, D. Kemp, M. Berrill, and J. J. Rocca, “High-energy 13.9 nm table-top soft-x-ray laser at 2.5 Hz repetition rate excited by a slab-pumped Ti:sapphire laser,” Opt. Lett. 35(10), 1632–1634 (2010). [CrossRef] [PubMed]

[11] E. H. Anderson, “Specialized Electron Beam Nanolithography for EUV and X-Ray Diffractive Optics,” IEEE J. Quantum Electron. 42(1), 27–35 (2006). [CrossRef]

[12] mask provided by GLOBALFOUNDRIES.

[13] P. P. Naulleau, C. N. Anderson, J. Chiu, P. Denham, S. George, K. A. Goldberg, M. Goldstein, B. Hoef, R. Hudyma, and G. Jones, “22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool,” Microelectron. Eng. 86(4-6), 448–455 (2009). [CrossRef]

[14] J. M. Heck, D. T. Attwood, W. Meyer-Ilse, and E. Anderson, “Resolution determination in X-ray microscopy: an analysis of the effects of partial coherence and illumination spectrum,” J. X Ray Sci. Technol. 8, 95–104 (1998).

[15] K. A. Goldberg, P. P. Naulleau, A. Barty, S. B. Rekawa, C. D. Kemp, R. F. Gunion, F. Salmassi, E. M. Gullikson, E. H. Anderson, and H.-S. Han, “Performance of actinic EUVL mask imaging using a zoneplate microscope,” Proc. SPIE 6730, 67305E-1-12 (2007).

[16] SPLAT, http://cuervo2.eecs.berkeley.edu/ .

[17] K. A. Goldberg, I. Mochi, P. P. Naulleau, H.-S. Han, and S. Huh, “Benchmarking EUV mask inspection beyond 0.25 NA,” Proc. SPIE 7122, 71222E-1 (2008).

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Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks