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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 14 — Jul. 5, 2010
  • pp: 14467–14473

Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks

Fernando Brizuela, Sergio Carbajo, Anne Sakdinawat, David Alessi, Dale H. Martz, Yong Wang, Bradley Luther, Kenneth A. Goldberg, Iacopo Mochi, David T. Attwood, Bruno La Fontaine, Jorge J. Rocca, and Carmen S. Menoni  »View Author Affiliations


Optics Express, Vol. 18, Issue 14, pp. 14467-14473 (2010)
http://dx.doi.org/10.1364/OE.18.014467


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Abstract

We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.

© 2010 OSA

OCIS Codes
(110.7440) Imaging systems : X-ray imaging
(140.7240) Lasers and laser optics : UV, EUV, and X-ray lasers
(180.7460) Microscopy : X-ray microscopy

ToC Category:
Microscopy

History
Original Manuscript: April 12, 2010
Revised Manuscript: June 18, 2010
Manuscript Accepted: June 18, 2010
Published: June 22, 2010

Citation
Fernando Brizuela, Sergio Carbajo, Anne Sakdinawat, David Alessi, Dale H. Martz, Yong Wang, Bradley Luther, Kenneth A. Goldberg, Iacopo Mochi, David T. Attwood, Bruno La Fontaine, Jorge J. Rocca, and Carmen S. Menoni, "Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks," Opt. Express 18, 14467-14473 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-14-14467


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References

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