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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 17 — Aug. 16, 2010
  • pp: 17788–17795

Interferometric characterization of a sub-wavelength near-infrared negative index metamaterial

Xuhuai Zhang, Marcelo Davanço, Kara Maller, Thomas W. Jarvis, Chihhui Wu, Chris Fietz, Dmitriy Korobkin, Xiaoqin Li, Gennady Shvets, and Stephen R. Forrest  »View Author Affiliations


Optics Express, Vol. 18, Issue 17, pp. 17788-17795 (2010)
http://dx.doi.org/10.1364/OE.18.017788


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Abstract

Negative phase advance through a single layer of near-IR negative index metamaterial (NIM) is identified through interferometric measurements. The NIM unit cell, sub-wavelength in both the lateral and light propagation directions, is comprised of a pair of Au strips separated by two dielectric and one Au film. Numerical simulations show that the negative phase advance through the single-layer sample is consistent with the negative index exhibited by a bulk material comprised of multiple layers of the same structure. We also numerically demonstrate that the negative index band persists in the lossless limit.

© 2010 OSA

OCIS Codes
(160.3918) Materials : Metamaterials
(050.5298) Diffraction and gratings : Photonic crystals
(050.6624) Diffraction and gratings : Subwavelength structures

ToC Category:
Metamaterials

History
Original Manuscript: June 16, 2010
Revised Manuscript: July 11, 2010
Manuscript Accepted: July 26, 2010
Published: August 3, 2010

Citation
Xuhuai Zhang, Marcelo Davanço, Kara Maller, Thomas W. Jarvis, Chihhui Wu, Chris Fietz, Dmitriy Korobkin, Xiaoqin Li, Gennady Shvets, and Stephen R. Forrest, "Interferometric characterization of a sub-wavelength near-infrared negative index metamaterial," Opt. Express 18, 17788-17795 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-17-17788


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