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Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy. |
Optics Express, Vol. 18, Issue 20, pp. 21490-21497 (2010)
http://dx.doi.org/10.1364/OE.18.021490
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Abstract
Femtosecond laser micromachining of glass material using low-energy, sub-ablation threshold pulses find numerous applications in the fields of integrated optics, lab-on-a-chips and microsystems in general. In this paper, we study the influence of the laser-deposited energy on the performance of the micromachining process. In particular, we show that the energy deposited in the substrate affects its etching rate. Furthermore, we demonstrate the existence of an optimal energy deposition value. These results are not only important from an industrial point-of-view but also provide new evidences supporting the essential role of densification and consequently stress-generation as the main driving factor promoting enhanced etching rate following laser exposure.
© 2010 OSA
OCIS Codes
(140.7090) Lasers and laser optics : Ultrafast lasers
(160.2750) Materials : Glass and other amorphous materials
(320.2250) Ultrafast optics : Femtosecond phenomena
(320.7130) Ultrafast optics : Ultrafast processes in condensed matter, including semiconductors
ToC Category:
Laser Microfabrication
History
Original Manuscript: August 10, 2010
Revised Manuscript: September 5, 2010
Manuscript Accepted: September 8, 2010
Published: September 24, 2010
Citation
Sheeba Rajesh and Yves Bellouard, "Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy.," Opt. Express 18, 21490-21497 (2010)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-18-20-21490
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