© 2010 OSA

1. D. A. Tichenor, A. K. Ray-Chaudhuri, S. H. Lee, H. N. Chapman, W. C. Replogle, K. W. Berger, R. H. Stulen, G. D. Kubiak, L. E. Klebanoff, J. B. Wronosky, D. J. O’Connell, A. H. Leung, K. L. Jefferson, W. P. Ballard, L. C. Hale, K. Blaedel, J. S. Taylor, J. A. Folta, E. Spiller, R. Soufti, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, D. T. Attwood, U. Mickan, R. Hansen, E. Panning, P.-Y. Yan, J. E. Bjorkholm, and C. W. Gwyn, “Initial Results from the EUV Engineering Test Stand,” Proc. SPIE 4506, 9 (2001).
2. H. Meiling, J. Benshop, U. Dinger, and P. Kurz, “Progress of the EUVL alphatool,” Proc. SPIE 4343, 38–50 (2001).
3. P. Lee, “Uniform and graded multilayers as x-ray optical elements,” Appl. Opt. 22(8), 1241–1246 (1983). [PubMed]
4. K. D. Joensen, P. Voutov, A. Szentgyorgyi, J. Roll, P. Gorenstein, P. Hoghoj, and F. E. Christensen, “Design of grazing-incidence multilayer supermirrors for hard-x-ray reflectors,” Appl. Opt. 34(34), 7935–7944 (1995). [PubMed]
5. P. van Loevezijn, R. Schlatmann, J. Verhoeven, B. A. van Tiggelen, and E. M. Gullikson, “Numerical and experimental study of disordered multilayers for broadband X-ray reflection,” Appl. Opt. 35(19), 3614–3619 (1996). [PubMed]
6. V. V. Protopopov and V. A. Kalnov, “X-ray multilayer mirrors with an extended angular range,” Opt. Commun. 158(1-6), 127–140 (1998).
7. A. V. Vinogradov and R. M. Faschenko, “An approach to the theory of X-ray multilayers with graded period,” Nucl. Instrum. Methods Phys. Res. A 448(1-2), 142–146 (2000).
8. Z. Wang and A. G. Michette, “Optimization of depth-graded multilayer designs for EUV and X-ray optics,” Proc. SPIE 4145, 243–253 (2001).
9. I. Vkozhevnikov, I. Nbukreeva, and E. Ziegler, “Design of x-ray supermirrors,” Nucl. Instrum. Methods Phys. Res. A 460(2-3), 424–443 (2001).
10. K. D. Joensen, P. Gorenstein, F. E. Christensen, P. Høghøj, E. Ziegler, J. Susini, A. Freund, and J. Wood, “Multilayer mirrors: broad-band reflection coatings for the 15 to 100 keV range,” Proc. SPIE 2253, 299–308 (1994).
11. S. P. Vernon, D. G. Stearns, and R. S. Rosen, “Chirped multilayer coatings for increased x-ray throughput,” Opt. Lett. 18(9), 672–674 (1993). [PubMed]
12. C. Morawe, E. Ziegler, J.-C. Peffen, and I. V. Kozhevnikov, “Design and fabrication of depth-graded x-ray multilayers,” Nucl. Instrum. Methods Phys. Res. A 493(3), 189–198 (2002).
13. T. Feigl, S. Yulin, N. Benoit, and N. Kaiser, “EUV multilayer optics,” Microelectron. Eng. 83(4-9), 703–706 (2006).
14. T. Kuhlmann, S. A. Yulin, T. Feigl, N. Kaiser, H. Bernitzki, and H. Lauth, “Design and fabrication of broadband EUV multilayer mirrors,” Proc. SPIE 4688, 509 (2002).
15. S. Yulin, T. Kuhlmann, T. Feigl, and N. Kaiser, “Spectral reflectance tuning of EUV mirrors for metrology applications,” Proc. SPIE 5037, 286–293 (2003).
16. J. E. Dennis, Jr., and R. B. Schnabel, in Numerical Methods for Unconstrained Optimization and Nonlinear Equations, Prentice-Hall, Englewood Cliffs, ed. (NJ, 1983).
17. J. M. Slaughter, A. Shapiro, P. A. Kearney, and C. M. Falco, “Growth of molybdenum on silicon: Structure and interface formation,” Phys. Rev. B 44(8), 3854–3863 (1991).
18. A. E. Yakshin, E. Louis, P. C. Gorts, E. L. G. Maas, and F. Bijkerk, “Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry,” Physica B 283(1-3), 143–148 (2000).
19. S. Bajt, D. G. Stearns, and P. A. Kearney, “Investigation of the amorphous-tocrystalline transition in Mo/Si multilayers,” J. Appl. Phys. 90(2), 1017–1025 (2001).
20. D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Fabrication of high-reflectance Mo-Si multilayer mirrors by planar-magnetron sputtering,” J. Vac. Sci. Technol. A 9(5), 2662–2669 (1991).
21. S. Yulin, T. Feigl, T. Kuhlmann, N. Kaiser, A. I. Fedorenko, V. V. Kondratenko, O. V. Poltseva, V. A. Sevryukova, A. Yu. Zolotaryov, and E. N. Zubarev, “Interlayer transition zones in Mo/Si superlattices,” J. Appl. Phys. 92(3), 1216–1220 (2002).
22. S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors,” Jpn. J. Appl. Phys. 41(Part 1, No. 6B), 4074–4081 (2002).
23. N. Kaiser, S. Yulin, and T. Feigl, “Si-based multilayers with high thermal stability,” Proc. SPIE 4146, 91 (2000).
24. J. B. Shellan, P. Agmon, P. Yeh, and A. Yariv, “Statistical analysis of Bragg reflectors,” J. Opt. Soc. Am. 68(1), 18–27 (1978).
25. E. Spiller, “Characterization of Multilayer Coatings by X-Ray Reflection,” Rev. Phys. Appl. (Paris) 23(10), 1687–1700 (1988).
26. M. J. H. Kessels, F. Bijkerk, F. D. Tichelaar, and J. Verhoeven, “Determination of in-depth density profiles of multilayer structures,” J. Appl. Phys. 97(9Issue 9), 093513 (2005).
27. I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk, “Temperature-dependent nanocrystal formation in Mo/Si multilayers,” Phys. Rev. B 76(24Issue 24), 245404 (2007).
28. I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk, “Thermally enhanced interdiffusion in Mo/Si multilayers,” J. Appl. Phys. 103(8Issue 8), 083549 (2008).
29. E. Louis, H.-J. Voorma, N. B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Yu. Ya. Platonov, G. E. van Dorssen, and H. A. Padmore, “Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment,” Microelectron. Eng. 23(1-4), 215–218 (1994).
30. E. Spiller, in Soft X-ray optics, Bellingham ed. (SPIE Optical Engineering Press, Washington 1994).
31. R. Schlatmann, S. Lu, J. Verhoeven, E. J. Puik, and M. J. van der Wiel, “Modification by Ar and Kr ion bombardment of Mo/Si x-ray multilayers,” Appl. Surf. Sci. 78(2), 147–157 (1994).
32. J. Tümmler, H. Blume, G. Brandt, J. Eden, B. Meyer, H. Scherr, F. Scholz, and G. Ulm, “Characterization of the PTB EUV reflectometry facility for large EUVL optical components,” Proc. SPIE 5037, 265–273 (2003).
33. A. Gottwald, U. Kroth, M. Letz, H. Schoeppe, and M. Richter, “High-accuracy VUV reflectometry at selectable sample temperatures,” Proc. SPIE 5538, 157–164 (2004).

Appl. Opt.

• P. Lee, “Uniform and graded multilayers as x-ray optical elements,” Appl. Opt. 22(8), 1241–1246 (1983). [PubMed]
• K. D. Joensen, P. Voutov, A. Szentgyorgyi, J. Roll, P. Gorenstein, P. Hoghoj, and F. E. Christensen, “Design of grazing-incidence multilayer supermirrors for hard-x-ray reflectors,” Appl. Opt. 34(34), 7935–7944 (1995). [PubMed]
• P. van Loevezijn, R. Schlatmann, J. Verhoeven, B. A. van Tiggelen, and E. M. Gullikson, “Numerical and experimental study of disordered multilayers for broadband X-ray reflection,” Appl. Opt. 35(19), 3614–3619 (1996). [PubMed]

Appl. Surf. Sci.

• R. Schlatmann, S. Lu, J. Verhoeven, E. J. Puik, and M. J. van der Wiel, “Modification by Ar and Kr ion bombardment of Mo/Si x-ray multilayers,” Appl. Surf. Sci. 78(2), 147–157 (1994).

J. Appl. Phys.

• M. J. H. Kessels, F. Bijkerk, F. D. Tichelaar, and J. Verhoeven, “Determination of in-depth density profiles of multilayer structures,” J. Appl. Phys. 97(9Issue 9), 093513 (2005).
• I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk, “Thermally enhanced interdiffusion in Mo/Si multilayers,” J. Appl. Phys. 103(8Issue 8), 083549 (2008).
• S. Bajt, D. G. Stearns, and P. A. Kearney, “Investigation of the amorphous-tocrystalline transition in Mo/Si multilayers,” J. Appl. Phys. 90(2), 1017–1025 (2001).
• S. Yulin, T. Feigl, T. Kuhlmann, N. Kaiser, A. I. Fedorenko, V. V. Kondratenko, O. V. Poltseva, V. A. Sevryukova, A. Yu. Zolotaryov, and E. N. Zubarev, “Interlayer transition zones in Mo/Si superlattices,” J. Appl. Phys. 92(3), 1216–1220 (2002).

J. Opt. Soc. Am.

• J. B. Shellan, P. Agmon, P. Yeh, and A. Yariv, “Statistical analysis of Bragg reflectors,” J. Opt. Soc. Am. 68(1), 18–27 (1978).

J. Vac. Sci. Technol. A

• D. G. Stearns, R. S. Rosen, and S. P. Vernon, “Fabrication of high-reflectance Mo-Si multilayer mirrors by planar-magnetron sputtering,” J. Vac. Sci. Technol. A 9(5), 2662–2669 (1991).

Jpn. J. Appl. Phys.

• S. Braun, H. Mai, M. Moss, R. Scholz, and A. Leson, “Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors,” Jpn. J. Appl. Phys. 41(Part 1, No. 6B), 4074–4081 (2002).

Microelectron. Eng.

• E. Louis, H.-J. Voorma, N. B. Koster, L. Shmaenok, F. Bijkerk, R. Schlatmann, J. Verhoeven, Yu. Ya. Platonov, G. E. van Dorssen, and H. A. Padmore, “Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment,” Microelectron. Eng. 23(1-4), 215–218 (1994).
• T. Feigl, S. Yulin, N. Benoit, and N. Kaiser, “EUV multilayer optics,” Microelectron. Eng. 83(4-9), 703–706 (2006).

Nucl. Instrum. Methods Phys. Res. A

• I. Vkozhevnikov, I. Nbukreeva, and E. Ziegler, “Design of x-ray supermirrors,” Nucl. Instrum. Methods Phys. Res. A 460(2-3), 424–443 (2001).
• C. Morawe, E. Ziegler, J.-C. Peffen, and I. V. Kozhevnikov, “Design and fabrication of depth-graded x-ray multilayers,” Nucl. Instrum. Methods Phys. Res. A 493(3), 189–198 (2002).
• A. V. Vinogradov and R. M. Faschenko, “An approach to the theory of X-ray multilayers with graded period,” Nucl. Instrum. Methods Phys. Res. A 448(1-2), 142–146 (2000).

Opt. Commun.

• V. V. Protopopov and V. A. Kalnov, “X-ray multilayer mirrors with an extended angular range,” Opt. Commun. 158(1-6), 127–140 (1998).

Opt. Lett.

• S. P. Vernon, D. G. Stearns, and R. S. Rosen, “Chirped multilayer coatings for increased x-ray throughput,” Opt. Lett. 18(9), 672–674 (1993). [PubMed]

Phys. Rev. B

• I. Nedelcu, R. W. E. van de Kruijs, A. E. Yakshin, and F. Bijkerk, “Temperature-dependent nanocrystal formation in Mo/Si multilayers,” Phys. Rev. B 76(24Issue 24), 245404 (2007).
• J. M. Slaughter, A. Shapiro, P. A. Kearney, and C. M. Falco, “Growth of molybdenum on silicon: Structure and interface formation,” Phys. Rev. B 44(8), 3854–3863 (1991).

Physica B

• A. E. Yakshin, E. Louis, P. C. Gorts, E. L. G. Maas, and F. Bijkerk, “Determination of the layered structure in Mo/Si multilayers by grazing incidence X-ray reflectometry,” Physica B 283(1-3), 143–148 (2000).

Proc. SPIE

• N. Kaiser, S. Yulin, and T. Feigl, “Si-based multilayers with high thermal stability,” Proc. SPIE 4146, 91 (2000).
• J. Tümmler, H. Blume, G. Brandt, J. Eden, B. Meyer, H. Scherr, F. Scholz, and G. Ulm, “Characterization of the PTB EUV reflectometry facility for large EUVL optical components,” Proc. SPIE 5037, 265–273 (2003).
• A. Gottwald, U. Kroth, M. Letz, H. Schoeppe, and M. Richter, “High-accuracy VUV reflectometry at selectable sample temperatures,” Proc. SPIE 5538, 157–164 (2004).
• K. D. Joensen, P. Gorenstein, F. E. Christensen, P. Høghøj, E. Ziegler, J. Susini, A. Freund, and J. Wood, “Multilayer mirrors: broad-band reflection coatings for the 15 to 100 keV range,” Proc. SPIE 2253, 299–308 (1994).
• T. Kuhlmann, S. A. Yulin, T. Feigl, N. Kaiser, H. Bernitzki, and H. Lauth, “Design and fabrication of broadband EUV multilayer mirrors,” Proc. SPIE 4688, 509 (2002).
• S. Yulin, T. Kuhlmann, T. Feigl, and N. Kaiser, “Spectral reflectance tuning of EUV mirrors for metrology applications,” Proc. SPIE 5037, 286–293 (2003).
• Z. Wang and A. G. Michette, “Optimization of depth-graded multilayer designs for EUV and X-ray optics,” Proc. SPIE 4145, 243–253 (2001).
• D. A. Tichenor, A. K. Ray-Chaudhuri, S. H. Lee, H. N. Chapman, W. C. Replogle, K. W. Berger, R. H. Stulen, G. D. Kubiak, L. E. Klebanoff, J. B. Wronosky, D. J. O’Connell, A. H. Leung, K. L. Jefferson, W. P. Ballard, L. C. Hale, K. Blaedel, J. S. Taylor, J. A. Folta, E. Spiller, R. Soufti, G. E. Sommargren, D. W. Sweeney, P. Naulleau, K. A. Goldberg, E. M. Gullikson, J. Bokor, D. T. Attwood, U. Mickan, R. Hansen, E. Panning, P.-Y. Yan, J. E. Bjorkholm, and C. W. Gwyn, “Initial Results from the EUV Engineering Test Stand,” Proc. SPIE 4506, 9 (2001).
• H. Meiling, J. Benshop, U. Dinger, and P. Kurz, “Progress of the EUVL alphatool,” Proc. SPIE 4343, 38–50 (2001).

Rev. Phys. Appl. (Paris)

• E. Spiller, “Characterization of Multilayer Coatings by X-Ray Reflection,” Rev. Phys. Appl. (Paris) 23(10), 1687–1700 (1988).

Other

• E. Spiller, in Soft X-ray optics, Bellingham ed. (SPIE Optical Engineering Press, Washington 1994).
• J. E. Dennis, Jr., and R. B. Schnabel, in Numerical Methods for Unconstrained Optimization and Nonlinear Equations, Prentice-Hall, Englewood Cliffs, ed. (NJ, 1983).

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