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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 18, Iss. 7 — Mar. 29, 2010
  • pp: 7269–7280

Reflectometer-based metrology for high-aspect ratio via measurement

Yi-Sha Ku and Fu Shiang Yang  »View Author Affiliations

Optics Express, Vol. 18, Issue 7, pp. 7269-7280 (2010)

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We develop a modified thin film model with adjustable ratio of the illuminated surface areas for accurate reflectivity calculation of deep via structures. We also propose a method combining a half oblate spheroid model and a reflectance modulation algorithm for extraction of via bottom profile from the measured reflectance spectrum. We demonstrate the use and enhancement of an existing wafer metrology tool, spectral reflectometer by implementing novel theoretical model and measurement algorithm for through-silicon via (TSV) inspection. Our non-destructive solution can measure TSV profile diameters as small as 5 μm and aspect ratios greater than 13:1. The measurement precision is in the range of 0.02 μm. Metrology results from actual 3D interconnect processing wafers are presented.

© 2010 OSA

OCIS Codes
(120.3940) Instrumentation, measurement, and metrology : Metrology
(300.6550) Spectroscopy : Spectroscopy, visible

ToC Category:
Instrumentation, Measurement, and Metrology

Original Manuscript: January 8, 2010
Revised Manuscript: March 7, 2010
Manuscript Accepted: March 22, 2010
Published: March 24, 2010

Yi-Sha Ku and Fu Shiang Yang, "Reflectometer-based metrology for high-aspect ratio via measurement," Opt. Express 18, 7269-7280 (2010)

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