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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 10 — May. 9, 2011
  • pp: 9535–9540

In situ control and monitoring of photonic device intermixing during laser irradiation

C. K. Chia, M. Suryana, and M. Hopkinson  »View Author Affiliations

Optics Express, Vol. 19, Issue 10, pp. 9535-9540 (2011)

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Apparatus and method for the in situ control of photonic device intermixing processes are described. The setup utilises an optical fiber splitter which delivers photons to selectively anneal the photonic device and simultaneously measures the emission spectra from the device to monitor the intermixing process in real time. The in situ monitoring of a laser annealing process for the modification of a semiconductor laser diode facet is demonstrated using the instrumentation. A progressive blueshift in the emission wavelength of the device can clearly be observed in real time while high energy photons are delivered to anneal the device facet, hence enabling the control on the degree of intermixing required. This instrumentation is also ideal for broadening of emission spectra in quantum dot and quantum well based light emitting devices such as superluminescent diodes and broadband laser.

© 2011 OSA

OCIS Codes
(120.4570) Instrumentation, measurement, and metrology : Optical design of instruments
(120.6810) Instrumentation, measurement, and metrology : Thermal effects
(140.3390) Lasers and laser optics : Laser materials processing
(140.5960) Lasers and laser optics : Semiconductor lasers
(230.3670) Optical devices : Light-emitting diodes
(230.5590) Optical devices : Quantum-well, -wire and -dot devices
(230.7370) Optical devices : Waveguides

ToC Category:
Laser Microfabrication

Original Manuscript: February 16, 2011
Revised Manuscript: April 1, 2011
Manuscript Accepted: April 6, 2011
Published: May 2, 2011

C. K. Chia, M. Suryana, and M. Hopkinson, "In situ control and monitoring of photonic device intermixing during laser irradiation," Opt. Express 19, 9535-9540 (2011)

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