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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 11 — May. 23, 2011
  • pp: 10686–10691

Displacement Talbot lithography: a new method for high-resolution patterning of large areas

Harun H. Solak, Christian Dais, and Francis Clube  »View Author Affiliations

Optics Express, Vol. 19, Issue 11, pp. 10686-10691 (2011)

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Periodic micro and nano-structures can be lithographically produced using the Talbot effect. However, the limited depth-of-field of the self-images has effectively prevented its practical use, especially for high-resolution structures with periods less than 1 micrometer. In this article we show that by integrating the diffraction field transmitted by a grating mask over a distance of one Talbot period, one can obtain an effective image that is independent of the absolute distance from the mask. In this way high resolution periodic patterns can be printed without the depth-of-field limitation of Talbot self-images. For one-dimensional patterns the image obtained is shown to be related to the convolution of the mask transmission function with itself. This technique, which we call Displacement Talbot Lithography (DTL), enables high-resolution photolithography without the need for complex and expensive projection optics for the production of periodic structures like diffraction gratings or photonic crystals. Experimental results showing the printing of linear gratings and an array of holes on a hexagonal lattice are presented.

© 2011 OSA

OCIS Codes
(050.2770) Diffraction and gratings : Gratings
(090.1970) Holography : Diffractive optics
(110.5220) Imaging systems : Photolithography
(110.6760) Imaging systems : Talbot and self-imaging effects
(050.5298) Diffraction and gratings : Photonic crystals

ToC Category:
Diffraction and Gratings

Original Manuscript: March 28, 2011
Revised Manuscript: May 12, 2011
Manuscript Accepted: May 13, 2011
Published: May 16, 2011

Harun H. Solak, Christian Dais, and Francis Clube, "Displacement Talbot lithography: a new method for high-resolution patterning of large areas," Opt. Express 19, 10686-10691 (2011)

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