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Optics Express

Optics Express

  • Editor: C. Martijn de Sterke
  • Vol. 19, Iss. 19 — Sep. 12, 2011
  • pp: 18080–18090

In situ aberration measurement technique based on principal component analysis of aerial image

Lifeng Duan, Xiangzhao Wang, Anatoly Y. Bourov, Bo Peng, and Peng Bu  »View Author Affiliations


Optics Express, Vol. 19, Issue 19, pp. 18080-18090 (2011)
http://dx.doi.org/10.1364/OE.19.018080


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Abstract

We propose a novel in situ aberration measurement technique for lithographic projection lens by use of aerial image based on principal component analysis (AMAI-PCA). The aerial image space, principal component space and Zernike space are introduced to create a transformation model between aerial images and Zernike coefficients. First the aberration-induced aerial images of measurement marks are simulated to form an aerial image space with a statistical Box–Behnken design pattern. The aerial image space is then represented by their principal components based on principal component analysis. The principal component coefficients of the aerial images are finally connected with Zernike coefficients by a regression matrix through regression analysis. Therefore in situ aberration measurement can be achieved based on the regression matrix and the principal component coefficients of the detected aerial images. The measurement performance of the proposed AMAI-PCA technique is demonstrated superior compared to that of the conventional TAMIS technique by using a lithographic simulator tool (Prolith). We also tested the actual performance of AMAI-PCA technique on a prototype wafer exposure tool. The testing results show our proposed technique can rapidly measure the aberrations up to high-order Zernike polynomial term with 1σ repeatability of 0.5nm to 2.3nm depending on the aberration type and range.

© 2011 OSA

OCIS Codes
(110.3960) Imaging systems : Microlithography
(120.3940) Instrumentation, measurement, and metrology : Metrology
(220.1010) Optical design and fabrication : Aberrations (global)

ToC Category:
Instrumentation, Measurement, and Metrology

History
Original Manuscript: July 25, 2011
Revised Manuscript: August 20, 2011
Manuscript Accepted: August 22, 2011
Published: August 30, 2011

Citation
Lifeng Duan, Xiangzhao Wang, Anatoly Y. Bourov, Bo Peng, and Peng Bu, "In situ aberration measurement technique based on principal component analysis of aerial image," Opt. Express 19, 18080-18090 (2011)
http://www.opticsinfobase.org/oe/abstract.cfm?URI=oe-19-19-18080


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